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Combinatorial approach to exploration of a novel fluid oxide flux stable in vacuum for material processing

Published online by Cambridge University Press:  26 February 2011

Yuji Matsumoto
Affiliation:
matsumoto@oxide.msl.titech.ac.jp, Tokyo Institute of Technology, Materials and Structures Laboratory, 4259 Nagatsuta Midori-ku, Yokohama, Kanagawa, 226-8503, Japan, +81-45-924-5314, +81-45-924-5377
Hideomi Koinuma
Affiliation:
koinuma@oxide.msl.titech.ac.jp
Hirohiko Tsuruta
Affiliation:
tsuruta@oxide.msl.titech.ac.jp, Japan
Ryota Takahashi
Affiliation:
ryota.takahashi@iet.ntnu.no, Japan
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Abstract

We explored a new fluid flux stabilized even in the vacuum condition at high temperature by combinatorial pulsed laser deposition (PLD) approach. A small amount of CuO doped in BiOx was found to effectively stabilize BiOx even in 6 Torr O2 at 800°C. The application of this novel Bi-Cu-O flux to the vacuum process lead to the successful fabrication of a single crystal Bi4Ti3O12 film and the establishment of a more reliable process for preparation of an atomically flat LaAlO3(001) substrate.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

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References

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