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Detection of plasmonic behavior in colloidal indium tin oxide films by impedance spectroscopy

Published online by Cambridge University Press:  06 April 2020

Salil M. Joshi
Affiliation:
School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, GA30332, USA
Ning Xia
Affiliation:
School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, GA30332, USA
Yolande Berta
Affiliation:
School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, GA30332, USA
Yong Ding
Affiliation:
School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, GA30332, USA
Rosario A. Gerhardt*
Affiliation:
School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, GA30332, USA
Kenneth C. Littrell
Affiliation:
Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, TN37831, USA
Eric Woods
Affiliation:
The Institute for Electronics and Nanotechnology, Georgia Institute of Technology, Atlanta, GA30332, USA
Mengkun Tian
Affiliation:
The Institute for Electronics and Nanotechnology, Georgia Institute of Technology, Atlanta, GA30332, USA
*
Address all correspondence to Rosario A. Gerhardt at rosario.gerhardt@mse.gatech.edu
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Abstract

Impedance spectroscopy was conducted on colloidal ITO thin films that had been subjected to alternating oxygen and argon plasma treatments, followed by air annealing from 150 to 750 °C. An equivalent circuit consisting of an RC element nested within another RC element, featuring a negative resistance and a negative capacitance, fitted the data well. These results are interpreted as being due to surface plasmons that are a function of the presence of nanoporous ITO-rich regions surrounded by isolated ITO nanoparticles coated with an amorphous polymer that intertwines with the ITO-rich regions as a function of annealing treatment.

Type
Research Letters
Copyright
Copyright © Materials Research Society 2020

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