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Nanoimprint Lithography and Lithographically Induced Self-Assembly

  • Stephen Y. Chou

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Our ability to pattern nanostructures offers a unique path to discovery and innovation in science and technology. When nanostructures are smaller than a fundamental physical length scale, conventional theory may no longer apply, and new phenomena emerge.

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8.Zhang, W. and Chou, S.Y., “Multilevel Nanoimprint Lithography with Submicron Alignment on 4“ Wafers,” presented at the 44th Int. Conf. on Electron, Ion and Photo Beam Technology and Fabrication (EIPBN), Palm Springs, CA, May 30–June 2, 2000.
9.Pease, F.R.W. (unpublished); Smith, H.I. (unpublished).
10.Tan, H., Gilbertson, A., and Chou, S.Y., J. Vac. Sci. Technol., B 16 (1998) p. 3926.
11.Li, M.T., Wang, J., Zhuang, L., and Chou, S.Y., Appl. Phys. Lett. 76 (2000) p. 673.
12.Yu, Z.H., Schablitsky, S.J., and Chou, S.Y., Appl. Phys. Lett. 74 (1999) p. 2381.
13.Wu, W., Cui, B., Sun, X.Y., Zhang, W., Zhuang, L., and Chou, S.Y., J. Vac. Sci. Technol., B 16 (1998) p. 3825.
14.Wang, J., Schablitsky, S., Yu, Z., Wu, W., and Chou, S.Y., J. Vac. Sci. Technolm., B 17 (1999) p. 2957.
15.Yu, Z.H., Deshpande, P., Wu, W., Wang, J., and Chou, S.Y., Appl. Phys. Lett. 77 (2000) p. 927.
16.Wang, J., Sun, X.Y., Chen, L., and Chou, S.Y., Appl. Phys. Lett. 75 (1999) p. 2767.
17.Kamins, T.I., Ohlberg, D.A.A., Williams, R.S., Zhang, W., and Chou, S.Y., Appl. Phys. Lett. 74 (1999) p. 1773.
18.Wang, J., Sun, X.Y., Chen, L., Zhuang, L., and Chou, S.Y., Appl. Phys. Lett. 76 (1999) p. 166.
19.Chou, S.Y. and Zhuang, L., J. Vac. Sci. Technol., B 17 (1999) p. 3197.
20.Chou, S.Y., Zhuang, L., and Guo, L.J., Appl. Phys. Lett. 75 (7) (1999) p. 1004.
21.He, L. and Chou, S.Y., to be published.
22.Deshpande, P., Chen, L., He, L., and Chou, S.Y., “Concentric Ring Patterns in Polymer Films Formed by Lithographically-Induced Self-Assembly,” presented at the 44th Int. Conf. on Electron, Ion and Photo Beam Technology and Fabrication (EIPBN), Palm Springs, CA, May 30–June 2, 2000.
23.Deshpande, P., Sun, X., Chen, L., and Chou, S.Y., to be published.
24.Zhuang, L., He, L., and Chou, S.Y., to be published.
25.He, L. and Chou, S.Y., to be published.

Nanoimprint Lithography and Lithographically Induced Self-Assembly

  • Stephen Y. Chou

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