Hostname: page-component-848d4c4894-nmvwc Total loading time: 0 Render date: 2024-06-20T04:39:16.415Z Has data issue: false hasContentIssue false
  • English
  • Français

Reliability of the Properties of (Pb,La)(Zr,Ti)O3 Capacitors with Non–noble Metal Oxide Electrodes stored in an H2 Atmosphere

Published online by Cambridge University Press:  19 February 2016

Yoko Takada ,
Naoki Okamoto ,
Takeyasu Saito ,
Kazuo Kondo ,
Takeshi Yoshimura ,
Norifumi Fujimura ,
Koji Higuchi ,
Akira Kitajima  and
Rie Shishido
Yoko Takada*
Affiliation:
Department of Chemical Engineering, Osaka Prefecture University, Sakai 599-8531, Japan
Naoki Okamoto
Affiliation:
Department of Chemical Engineering, Osaka Prefecture University, Sakai 599-8531, Japan
Takeyasu Saito
Affiliation:
Department of Chemical Engineering, Osaka Prefecture University, Sakai 599-8531, Japan
Kazuo Kondo
Affiliation:
Department of Chemical Engineering, Osaka Prefecture University, Sakai 599-8531, Japan
Takeshi Yoshimura
Affiliation:
Department of Physics and Electronics, Osaka Prefecture University, Sakai 599-8531, Japan
Norifumi Fujimura
Affiliation:
Department of Physics and Electronics, Osaka Prefecture University, Sakai 599-8531, Japan
Koji Higuchi
Affiliation:
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki 567-0047, Japan
Akira Kitajima
Affiliation:
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki 567-0047, Japan
Rie Shishido
Affiliation:
Institute of Multidisciplinary Research for Advances Materials, Tohoku University, Sendai 980-8577, Japan
*
*(Email: ytakada@chemeng.osakafu-u.ac.jp)
Get access

Abstract

We fabricated ferroelectric (Pb,La)(Zr,Ti)O3 (PLZT) capacitors with Sn:In2O3 (ITO) or Pt top electrodes and investigated the ferroelectric properties of these PLZT capacitors. The shape of polarization–voltage hysteresis loops was essentially unchanged and the decrease in the remnant polarization of the ITO/PLZT/Pt capacitors was smaller than that of the Pt/PLZT/Pt capacitors after annealing with 3% D2 (in N2) at 200°C and 1 Torr (i.e., FGAD). Time of flight secondary mass spectrometry revealed that the D atoms were incorporated into the PLZT film of the Pt/PLZT/Pt capacitors after 3% D2 annealing, resulting in a decrease in the ferroelectric properties. In comparison, no D ion signal was detected in the PLZT film after FGAD for ITO/PLZT/Pt capacitors.

Keywords

ferroelectricitysecondary ion mass spectroscopy (SIMS)thin film
Type
Articles
Information
MRS Advances , Volume 1 , Issue 5: Electronics and Photonics , 2016 , pp. 369 - 374
Copyright
Copyright © Materials Research Society 2016 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Gu, K., Liou, J.J., Li, W., Liu, Yang, and Li, P., Microelectron. Reliab. 55, 873 (2015).Google Scholar
Liu, S.Y., Chua, L., Tan, K. C., and Valavan, S.E., Thin Solid Films 518, e152 (2010).Google Scholar
Baldi, L., Bez, R., and Sandhu, G., Solid-State Electron. 102, 2 (2014).Google Scholar
Guo, R., You, L., Zhou, Y., Lim, Z.S., Zou, X., Chen, L., Ramesh, R., and Wang, J., Nat. Commun. 4, 1990 (2013).CrossRefGoogle Scholar
Fujisaki, Y., Jpn. J. Appl. Phys. 52, 040001 (2013).CrossRefGoogle Scholar
Takada, Y., Tsuji, T., Okamoto, N., Saito, T., Kondo, K., Yoshimura, T., Fujimura, N., Higuchi, K., Kitajima, A., and Iwai, H., Jpn. J. Appl. Phys. 54, 05ED03 (2015).Google Scholar
Niwa, K., Kotaka, Y., Tomotani, M., Ashida, H., Goto, Y., and Otani, S., Acta Mater. 48, 4755 (2000).CrossRefGoogle Scholar
Liang, C-S., Wu, L.-J., and Wu, J.-M., Electrochem. Solid-State Lett. 8, F29 (2005).Google Scholar
Hui, W., Chen, Z., Liu, X., and Jiang, A., Phys. Status Solidi A 209, 1109 (2012).Google Scholar
Yoon, J.-G., Seo, S., Kang, B.S., Kim, J.D., Noh, T.W., Lee, Y.K., and Park, Y.S., Jpn. J. Appl. Phys. 41, 6781 (2002).Google Scholar
Huang, C.-K., Chang, C.-H., and Wu, T.-B., J. Appl. Phys. 98, 104105 (2005).Google Scholar
Lee, E.S., Chung, H.W., Lim, S.H., and Lee, S.Y., J. Vac. Sci. Technol. A 23, 773 (2005).Google Scholar
Kerkache, L., Layadi, A., Dogheche, E., and Remiens, D., J. Alloys Compd. 509, 6072 (2011).Google Scholar
Bornand, V. and Papet, Ph., Mater. Chem. Phys. 92, 424 (2005).Google Scholar
Woo, W.S., Won, S.S., Ahn, C.W., Chae, S.A., Ullah, A., and Kim, I.W., J. Appl. Phys. 115, 034107 (2014).Google Scholar
Pak, J., Park, S., Nam, K., and Park, G., Thin Solid Films 518, 5642 (2010).Google Scholar
Cross, J.S., Horii, Y., Mizuta, N., Watanabe, S., and Eshita, T., Jpn. J. Appl. Phys. 41, 698 (2002).CrossRefGoogle Scholar
Cross, J.S., Kurihara, K., and Haneda, H., J. Appl. Phys. 98, 094107 (2005).Google Scholar
Hartner, W., Bosk, P., Schindler, G., Bachhofer, H., Mört, M., Wendt, H., Mikolajick, T., Dehm, C., Schroeder, H., and Waser, R., Appl. Phys. A 77, 571 (2003).Google Scholar
Takada, Y., Okamoto, N., Saito, T., Kondo, K., Yoshimura, T., Fujimura, N., Higuchi, K., Kitajima, A., Iwai, H., and Shishido, R., Proc. IEEE ISAF-ISIF-PFM 2015, 163 (2015).Google Scholar
Kek, D. and Bonanos, N., Solid State Ionics 125, 345 (1999).Google Scholar