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High Aspect Ratio Machining of Nanocarbon Materials by Reactive Ion Etching

Published online by Cambridge University Press:  23 January 2017

Atsuko Sekiguchi ,
Don N. Futaba ,
Takeo Yamada  and
Kenji Hata
Atsuko Sekiguchi*
Affiliation:
CNT-Application Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, 305-8565, JAPAN
Don N. Futaba
Affiliation:
CNT-Application Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, 305-8565, JAPAN
Takeo Yamada
Affiliation:
CNT-Application Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, 305-8565, JAPAN
Kenji Hata
Affiliation:
CNT-Application Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, 305-8565, JAPAN
*
*(Email: atsuko-sekiguchi@aist.go.jp)
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Abstract

We demonstrate anisotropic, vertical deep etching of graphite and densely packed carbon nanotube (CNT) thick layer beyond the micrometer scale, which representing the first step toward nanocarbon bulk micromachining. This micromachining process is compatible with standard lithography and therefore allows the fabrication of graphite and CNT architectures with 1 μm lateral resolution and up to 10 μm scale depth.

Keywords

machiningreactive ion etchingC
Type
Articles
Information
MRS Advances , Volume 2 , Issue 1: Nanomaterials , 2017 , pp. 9 - 14
Copyright
Copyright © Materials Research Society 2017 

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