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Things That Go “Bump” in the VPSEM - and How We Image with Them

Published online by Cambridge University Press:  02 July 2020

Brendan J Griffin
Brendan J Griffin*
Affiliation:
Centre for Microscopy and Microanalysis, The University of Western Australia, 35 Stirling Highway, Crawley, WA, 6009
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Abstract

Variable pressure scanning electron microscopes (VPSEM) differ from conventional SEM by operating at pressures ranging from the ‘high vacuum’ SEM levels of 10-6 torr up to typically around 2 torr. The environmental SEM or ESEM is a commercial variant which employs an unique multistage pressure-limiting aperture (PLA) system to attain specimen chamber operating pressures of up to 50 torr. Early instruments used air or argon as the imaging gas but more commonly today water vapour is used. A wide range of gases have been employed, including potentially explosive hydrogen-methane mixtures. The choice of gas is operator-based and can be varied during the imaging session.

Early VPESM were restricted to backscattered electron imaging (BSE) until the development of the gaseous secondary electron detector in the ESEM. Gaseous secondary electron detectors are now available for all models of VPSEM and together with compatible cathodoluminescence and EDS XRay detectors, the full range of SEM-based imaging options is present.

The principal distinguishing feature of VPSEM is, of course, that samples can be examined uncoated. Gas-electron interaction generates a positive ion supply that can minimise conventional charging artefacts, in a simple imaging model.

Type
Tutorials (Biological Sciences Tutorials Organized by G. Sosinsky) (Physical Sciences Tutorials Organized by I. Anderson)
Information
Microscopy and Microanalysis , Volume 7 , Issue S2: Proceedings: Microscopy & Microanalysis 2001, Microscopy Society of America 59th Annual Meeting, Microbeam Analysis Society 35th Annual Meeting, Long Beach, California August 5-9, 2001 , August 2001 , pp. 772 - 773
Copyright
Copyright © Microscopy Society of America 2001

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References

1.Robinson, B.W. and Nickel, E.H., Am Mineral 64 (1979)1322.Google Scholar
2.Danilatos, G.D., Adv. Electronics Electron Phys 78 (1990)1.CrossRefGoogle Scholar
3.Griffin, B J., Proc Ann EMSA Meeting 50 (1992)1306.Google Scholar
4.Meredith, P. and Donald, A.M., J. Microscopy 181 (1996)23.CrossRefGoogle Scholar
5.Griffin, B.J., et al., Institute of Physics Conference Series 165 (2000)263.Google Scholar
6.Doehne, E., Scanning, 19 (1997)75.CrossRefGoogle Scholar
7.Griffin, B.J. et al., Microbeam Analysis - Proc 28th Ann MAS Meeting (1994)245.Google Scholar
8.Griffin, B.J., Scanning 21 (2000)234.Google Scholar
9.Mohan, A. et al., Scanning 20 (1998)436.CrossRefGoogle Scholar
10.Watt, G. et al., Am Mineral 85 (2001)1784.CrossRefGoogle Scholar
11.Phillips, M.R. et al., Microsc Microanal 6 (2000)786.CrossRefGoogle Scholar
12.Griffin, B.J. and Suvorova, A.A., Microsc Microanal 6 (2000)this volume.Google Scholar
13.Thiel, B.L. et al, J. Microscopy 187 (1997)143.CrossRefGoogle Scholar
14.Craven, J.P. et al., Microsc Microanal 6 (2000)776.CrossRefGoogle Scholar
15.This research was supported by an ARC SPIRT and UWA small research grant to BJG.Google Scholar