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Study of the Atomic Structures of Si3N4/CeO2-x and Si3N4/SiO2 Interfaces Using STEM and First-Principles Methods

Published online by Cambridge University Press:  26 July 2009

W Walkosz ,
RF Klie ,
S Ogut ,
B Mikijelj ,
PF Becher ,
AY Borisevich ,
SJ Pennycook  and
JC Idrobo
W Walkosz
Affiliation:
University of Illinois,Chicago
RF Klie
Affiliation:
University of Illinois,Chicago
S Ogut
Affiliation:
University of Illinois,Chicago
B Mikijelj
Affiliation:
Ceradyne Inc
PF Becher
Affiliation:
Oak Ridge National Laboratory
AY Borisevich
Affiliation:
Oak Ridge National Laboratory
SJ Pennycook
Affiliation:
Oak Ridge National Laboratory
JC Idrobo
Affiliation:
University of Illinois,Chicago

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2009 in Richmond, Virginia, USA, July 26 – July 30, 2009

Type
Abstract
Information
Microscopy and Microanalysis , Volume 15 , Supplement S2 , July 2009 , pp. 1014 - 1015
Copyright
Copyright © Microscopy Society of America 2009