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Structural and Electronic Properties of Ti Doped ZnO: XRD, TEM, EELS and Ab-initio Simulations

Published online by Cambridge University Press:  04 August 2017

Medlin Rostislav
Affiliation:
New Technology Research Centre, University of West Bohemia, Univerzitni 8, 306 14 Pilsen, Czech Republic
Minar Jan
Affiliation:
New Technology Research Centre, University of West Bohemia, Univerzitni 8, 306 14 Pilsen, Czech Republic
Sutta Pavol
Affiliation:
New Technology Research Centre, University of West Bohemia, Univerzitni 8, 306 14 Pilsen, Czech Republic
Khan Wilayat
Affiliation:
New Technology Research Centre, University of West Bohemia, Univerzitni 8, 306 14 Pilsen, Czech Republic
Sipr Ondrej
Affiliation:
New Technology Research Centre, University of West Bohemia, Univerzitni 8, 306 14 Pilsen, Czech Republic
Novak Petr
Affiliation:
New Technology Research Centre, University of West Bohemia, Univerzitni 8, 306 14 Pilsen, Czech Republic
Netrvalova Marie
Affiliation:
New Technology Research Centre, University of West Bohemia, Univerzitni 8, 306 14 Pilsen, Czech Republic
Corresponding
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© Microscopy Society of America 2017 

References

[1] Siddheswaran, R., et al Reactive magnetron sputtering of Ni doped ZnO thin film: Investigation of optical, structural, mechanical and magnetic properties. Journal of Alloys and Compounds 636 2015 8592.CrossRefGoogle Scholar
[2] Siddheswaran, R., et al Structural and magnetic properties of the transition metals (TM=Co, Ni) and Nb co-doped SrTiO3 thin films. Materials Research Bulletin 83 2016 193200.CrossRefGoogle Scholar
[3] Blaha, P., at al, An Augmented Plane Wave plus Local Orbitals Program for Calculating Crystal Properties. Techn. Universitat Wien Vienna 2001.Google Scholar
[4] The result was developed within the CENTEM project no. CZ.1.05/2.1.00/03.0088, CENTEM PLUS (LO1402), CEDAMNF reg. no. CZ.02.1.01/0.0/0.0/15_003/0000358, co-funded by the ERDF and COST CZ LD15147.Google Scholar

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