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STEM Analysis Of Cu(Mn) Self-Forming Diffusion Barriers on SiO2 For Applications In The Semiconductor Industry

  • J.G. Lozano (a1), P. Nellist (a1), J. Bogan (a2), P. Casey (a2), A. McCay (a2) and G. Hughes (a2)...

Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

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STEM Analysis Of Cu(Mn) Self-Forming Diffusion Barriers on SiO2 For Applications In The Semiconductor Industry

  • J.G. Lozano (a1), P. Nellist (a1), J. Bogan (a2), P. Casey (a2), A. McCay (a2) and G. Hughes (a2)...

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