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Single and dual ion implantation of c:Si with Fe+ and C+: microstructural characterization

Published online by Cambridge University Press:  10 September 2015

B. Nunes ,
E. Alves  and
R. Colaço
B. Nunes*
Affiliation:
Departamento de BioEngenharia and Centro de Química Estrutural, Instituto Superior Técnico, University of Lisbon, Av. Rovisco Pais, 1049-001 Lisboa, PORTUGAL
E. Alves
Affiliation:
Campus Tecnológico e Nuclear, IPFN, Instituto Superior Técnico, University of Lisbon, EN10, 2695-066 Bobadela LRS, PORTUGAL
R. Colaço
Affiliation:
Departamento de BioEngenharia and Centro de Química Estrutural, Instituto Superior Técnico, University of Lisbon, Av. Rovisco Pais, 1049-001 Lisboa, PORTUGAL
*
Email: bruno.nunes@ist.utl.pt

Abstract

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Type
Material Sciences
Information
Microscopy and Microanalysis , Volume 21 , Supplement S6: Introduction to the SPMicros Special Issue from the XLVII Annual Congress , August 2015 , pp. 108 - 109
Copyright
Copyright © Microscopy Society of America 2015 

References

[1]Bhusan, Bharat, Microelectronic Engineering 84, 387, 2007.CrossRefGoogle Scholar
[2]Luo, J., et al, Journal of Micromechanics and Microengineering 17, S147, 2007.CrossRefGoogle Scholar
[3]Patton, S.T., et al, Tribology International 35, 373, 2002.CrossRefGoogle Scholar