Hostname: page-component-77c89778f8-9q27g Total loading time: 0 Render date: 2024-07-18T10:48:04.287Z Has data issue: false hasContentIssue false

Resolving 45 pm with 300 kV Aberration Corrected STEM

Published online by Cambridge University Press:  27 August 2014

H. Sawada
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo, 196-8558, Japan
N. Shimura
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo, 196-8558, Japan
K. Satoh
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo, 196-8558, Japan
E. Okunishi
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo, 196-8558, Japan
F. Hosokawa
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo, 196-8558, Japan
N. Shibata
Affiliation:
Institute of Engineering Innovation, The University of Tokyo, Tokyo 113-8656Japan
Y. Ikuhara
Affiliation:
Institute of Engineering Innovation, The University of Tokyo, Tokyo 113-8656Japan

Abstract

Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Copyright
Copyright © Microscopy Society of America 2014 

References

References:

[1] Haider, M, et al Nature 392 1998), p. 768.Google Scholar
[2] Krivanek, O L, et al Ultramicroscopy 78 1999), p. 1.Google Scholar
[3] Hosokawa, F, et al Microscopy 62 2013), p. 23.Google Scholar
[4] Nellist, P D, et al Science 305 2004), p. 1741.Google Scholar
[5] Sawada, H, et al Jpn. J.Appl. Phys. 46 2007), p. L568.Google Scholar
[6] Sawada, H, et al J. Electron Microsc. 58 2009), p. 357.Google Scholar
[7] Erni, R., et al Rev. Lett. 102 2009), p. 096101.Google Scholar
[8] O'Keefe, M., et al J. Electron Microsc. 54 2005), p. 169.Google Scholar