Remote Plasma Cleaning and Radical Recombination Rates

Ronald Vane; Ewa Kosmowska

doi:10.1017/S1431927616001082

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Remote Plasma Cleaning and Radical Recombination Rates

Published online by Cambridge University Press: 25 July 2016

Ronald Vane and

Ewa Kosmowska

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Ronald Vane: Affiliation:
XEI Scientific, Redwood City, CA, USA
Ewa Kosmowska: Affiliation:
XEI Scientific, Redwood City, CA, USA

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Type: Abstract
Information: Microscopy and Microanalysis , Volume 22 , Supplement S3: Proceedings of Microscopy & Microanalysis 2016 , July 2016 , pp. 46 - 47

DOI: https://doi.org/10.1017/S1431927616001082 [Opens in a new window]
Copyright: © Microscopy Society of America 2016

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Remote Plasma Cleaning and Radical Recombination Rates

Volume 22, Supplement S3
Ronald Vane ^(a1) and Ewa Kosmowska ^(a1)
DOI: https://doi.org/10.1017/S1431927616001082

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Remote Plasma Cleaning and Radical Recombination Rates

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