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Reducing Electron Beam Damage with Multipass Transmission Electron Microscopy

Published online by Cambridge University Press:  04 August 2017

Colin Ophus ,
Thomas Juffmann ,
Stewart A Koppell ,
Brannon B Klopfer ,
Robert Glaeser  and
Mark A Kasevich
Colin Ophus
Affiliation:
National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, USA.
Thomas Juffmann
Affiliation:
Department of Physics, Stanford University, Stanford, USA.
Stewart A Koppell
Affiliation:
Department of Physics, Stanford University, Stanford, USA.
Brannon B Klopfer
Affiliation:
Department of Physics, Stanford University, Stanford, USA.
Robert Glaeser
Affiliation:
Molecular Biophysics and Integrative Bioimaging, Lawrence Berkeley National Laboratory, Berkeley, USA.
Mark A Kasevich
Affiliation:
Department of Physics, Stanford University, Stanford, USA.

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 23 , Supplement S1: Proceedings of Microscopy & Microanalysis 2017 , July 2017 , pp. 1794 - 1795
Copyright
© Microscopy Society of America 2017 

References

[1] Giovannetti, V, Lloyd, S & Maccone, L Science 19 2004). p. 1330.Google Scholar
[2] Giovannetti, V, Lloyd, S & Maccone, L Physical Review Letters 96 2006). p. 010401.CrossRefGoogle Scholar
[3] Kruit, P, et al, Ultramicroscopy 164 2016). p. 32.CrossRefGoogle Scholar
[4] Juffmann, T, et al, Multi-pass Transmission Electron Microscopy (2016).Google Scholar
[5] Wagner, JM, et al, eLife 5 2016 e17063.Google Scholar
[6] Work at the Molecular Foundry was supported by the Office of Science, Office of Basic Energy Sciences, of the U.S. Department of Energy under Contract No. DE-AC02-05CH11231. This research was also supported by the Gordon and Betty Moore Foundation and the Stanford Graduate Fellowship..Google Scholar