Hostname: page-component-76fb5796d-x4r87 Total loading time: 0 Render date: 2024-04-26T11:00:57.029Z Has data issue: false hasContentIssue false
  • English
  • Français

Radial Interference Contrast in in-situ SEM Observation of Metal Oxide Semiconductor Film Crystallization

Published online by Cambridge University Press:  04 August 2017

Kunji Shigeto ,
Takio Kizu ,
Kazuhito Tsukagoshi  and
Toshihide Nabatame
Kunji Shigeto
Affiliation:
Hitachi High-Technologies Corporation, Kawasaki, Japan.
Takio Kizu
Affiliation:
NIMS MANA, Tsukuba, Japan.
Kazuhito Tsukagoshi
Affiliation:
NIMS MANA, Tsukuba, Japan.
Toshihide Nabatame
Affiliation:
NIMS MANA, Tsukuba, Japan.

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 23 , Supplement S1: Proceedings of Microscopy & Microanalysis 2017 , July 2017 , pp. 1512 - 1513
Copyright
© Microscopy Society of America 2017 

References

[1] Nomura, K, et al, Nature 432 2004 488.Google Scholar
[2] Kamiya, T, et al, NPG Asia Mater 2 2010 15.Google Scholar
[3] Aikawa, S, et al, App. Phys. Lett 103 2013 172105.Google Scholar
[4] Mitoma, N, et al, App. Phys. Lett 106 2015 042106.Google Scholar