Preparation to Target: Hit Target within ± 10 μm and a line of Target with in ± 25 μm with Common Metallographic Equipment

B. Rasmussen

doi:10.1017/S1431927602104715

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Preparation to Target: Hit Target within ± 10 μm and a line of Target with in ± 25 μm with Common Metallographic Equipment

Published online by Cambridge University Press: 01 August 2002

B. Rasmussen

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B. Rasmussen*: Affiliation:
Struers A/S, Valhojs Allé 176, DK-2610 Rodovre, Denmark

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Type: Abstract
Information: Microscopy and Microanalysis , Volume 8 , Issue S02 , August 2002 , pp. 1256 - 1257

DOI: https://doi.org/10.1017/S1431927602104715 [Opens in a new window]
Copyright: Copyright © Microscopy Society of America 2002

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Preparation to Target: Hit Target within ± 10 μm and a line of Target with in ± 25 μm with Common Metallographic Equipment

Volume 8, Issue S02
B. Rasmussen ^(a1)
DOI: https://doi.org/10.1017/S1431927602104715

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Preparation to Target: Hit Target within ± 10 μm and a line of Target with in ± 25 μm with Common Metallographic Equipment

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