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Novel Workflow for Improved Throughput, Turnaround Time, and Cross Section Preparation of Microelectronic Devices

Published online by Cambridge University Press:  30 July 2020

William Podrazky ,
Jamil Clarke ,
Takeshi Sunaoshi ,
Akinari Morikawa ,
Chihiro Nomaguchi  and
Atsushi Muto
William Podrazky
Affiliation:
Hitachi High Technologies America, Inc, Clarksburg, Maryland, United States
Jamil Clarke
Affiliation:
Hitachi High Technologies America, Inc, Clarksburg, Maryland, United States
Takeshi Sunaoshi
Affiliation:
Hitachi High Technologies America, Inc, Clarksburg, Maryland, United States
Akinari Morikawa
Affiliation:
Hitachi High Tech Corporation, Hitachinaka, Ibaraki, Japan
Chihiro Nomaguchi
Affiliation:
Hitachi High Tech Corporation, Hitachinaka, Ibaraki, Japan
Atsushi Muto
Affiliation:
Hitachi High Technologies America, Inc, Clarksburg, Maryland, United States

Abstract

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Type
Vendor Symposium
Information
Microscopy and Microanalysis , Volume 26 , Supplement S2 , August 2020 , pp. 2712 - 2713
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Copyright
Copyright © Microscopy Society of America 2020

References

Goldstein, J. et al. , “Scanning Electron Microscopy and X-ray Microanalysis”, (2003) p.p. 537–555Google Scholar