Hostname: page-component-76fb5796d-qxdb6 Total loading time: 0 Render date: 2024-04-26T00:48:18.638Z Has data issue: false hasContentIssue false
  • English
  • Français

Nanobeam Diffraction and Geometric Phase Analysis for Strain Measurements in Si/SiGe Nanosheet Structures

Published online by Cambridge University Press:  25 July 2016

J. Li ,
S. Reboh ,
Robin Chao ,
N. Loubet ,
M. Guillorn ,
T. Yamashita  and
J. Gaudiello
J. Li
Affiliation:
IBM, Albany, NY
S. Reboh
Affiliation:
CEA LETI, Albany, NY
Robin Chao
Affiliation:
IBM, Albany, NY
N. Loubet
Affiliation:
IBM, Albany, NY
M. Guillorn
Affiliation:
IBM, Albany, NY
T. Yamashita
Affiliation:
IBM, Albany, NY
J. Gaudiello
Affiliation:
IBM, Albany, NY

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 22 , Supplement S3: Proceedings of Microscopy & Microanalysis 2016 , July 2016 , pp. 1528 - 1529
Copyright
© Microscopy Society of America 2016 

References

References:

[1] Ghani, T., etal., IEDM (p. 1161 (2003).Google Scholar
[2] This work was performed by the Research Alliance teams at various IBM Research and Development Facilities.Google Scholar