Hostname: page-component-77c89778f8-vsgnj Total loading time: 0 Render date: 2024-07-19T04:15:37.173Z Has data issue: false hasContentIssue false
  • English
  • Français

Nanoanalysis in SEM and STEM: EDS Using Silicon Drift Detectors in Comparison to EELS Using Cs-Corrected STEM

Published online by Cambridge University Press:  01 August 2010

M Falke ,
R Terborg ,
A Käppel ,
M Rohde ,
M Gass ,
A Bleloch ,
S Hermann ,
R Ecke ,
T Waechtler  and
S Schulz
M Falke
Affiliation:
Bruker-AXS Microanalysis GmbH
R Terborg
Affiliation:
Bruker-AXS Microanalysis GmbH
A Käppel
Affiliation:
Bruker-AXS Microanalysis GmbH
M Rohde
Affiliation:
Bruker-AXS Microanalysis GmbH
M Gass
Affiliation:
SuperSTEM Laboratory, United Kingdom
A Bleloch
Affiliation:
The University of Liverpool, United Kingdom
S Hermann
Affiliation:
Chemnitz Technical University
R Ecke
Affiliation:
Chemnitz Technical University
T Waechtler
Affiliation:
Chemnitz Technical University
S Schulz
Affiliation:
Chemnitz Technical University

Extract

Core share and HTML view are not available for this content. However, as you have access to this content, a full PDF is available via the ‘Save PDF’ action button.

Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Type
Abstract
Information
Microscopy and Microanalysis , Volume 16 , Supplement S2 , July 2010 , pp. 936 - 937
Copyright
Copyright © Microscopy Society of America 2010