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Mitigating Shadowing and Topographic Artifacts Using Dual EDS Detectors

Published online by Cambridge University Press:  30 July 2021

Shangshang Mu  and
Jens Rafaelsen
Shangshang Mu
Affiliation:
EDAX, United States
Jens Rafaelsen
Affiliation:
Ametek / EDAX LLC, Mahwah, New Jersey, United States

Abstract

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Type
Microscopy and Microanalysis for Real World Problem Solving
Information
Microscopy and Microanalysis , Volume 27 , Supplement S1 , August 2021 , pp. 1578 - 1580
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Copyright
Copyright © The Author(s), 2021. Published by Cambridge University Press on behalf of the Microscopy Society of America

References

Ronnhult, T., Brox, B. and Fritze, G., “The Influence of Surface Topography on the X-ray Intensity in Electron Microprobe Analysis (EDS/WDS),” Scanning, vol.9, pp. 81-87, 1987.CrossRefGoogle Scholar