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Localized Plasmon Response Engineering in B- and N-Doped Graphene

Published online by Cambridge University Press:  01 August 2018

Fredrik S. Hage
Affiliation:
SuperSTEM Laboratory, SciTech Daresbury Campus, Daresbury, United Kingdom
Demie M. Kepaptsoglou
Affiliation:
SuperSTEM Laboratory, SciTech Daresbury Campus, Daresbury, United Kingdom Department of Physics, University of York, Heslington, York, YO10 5BR, United Kingdom
Trevor P. Hardcastle
Affiliation:
School of Chemical and Process Engineering, University of Leeds, Leeds, LS2 9JT, United Kingdom
Morten N. Gjerding
Affiliation:
CAMD and Center for Nanostructured Graphene (CNG), Denmark Technical University, Fysikvej 1, building 307, 2800 Kgs. Lyngby, Denmark
Kirsten T. Winther
Affiliation:
CAMD and Center for Nanostructured Graphene (CNG), Denmark Technical University, Fysikvej 1, building 307, 2800 Kgs. Lyngby, Denmark
Julian A. Amani
Affiliation:
II Physikalisches Institut, Georg-August-Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
Hans C. Hofsaess
Affiliation:
II Physikalisches Institut, Georg-August-Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
Kristian S. Thygesen
Affiliation:
CAMD and Center for Nanostructured Graphene (CNG), Denmark Technical University, Fysikvej 1, building 307, 2800 Kgs. Lyngby, Denmark
Quentin M. Ramasse
Affiliation:
SuperSTEM Laboratory, SciTech Daresbury Campus, Daresbury, United Kingdom School of Chemical and Process Engineering, University of Leeds, Leeds, LS2 9JT, United Kingdom

Abstract

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Type
Abstract
Copyright
© Microscopy Society of America 2018 

References

[1] Bangert, U., et al, Nano Lett. 13 2013) p. 49024907.Google Scholar
[2] Kepaptsoglou, D., et al, ACS Nano 9 2015) p. 1139811407.Google Scholar
[3] Hage, F.S., et al, ACS Nano, Articles ASAP 2018) doi: 10.1021/acsnano.7b08650.Google Scholar
[4] Hardcastle, T.P., et al, J. Phys.: Condens. Matter 29 2017 225303.Google Scholar
[5] SuperSTEM is the U.K's National Research Facility for Advanced Electron Microscopy, funded by EPSRC.Google Scholar