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In-situ Correlative Analysis of electrical and magnetic properties of Ion-beam treated surfaces by combination of AFM and FIB

Published online by Cambridge University Press:  30 July 2021

Chistian Schwalb
Affiliation:
Quantum Design Microscopy GmbH, United States
Johanna Hütner
Affiliation:
GETec Microscopy GmbH, United States
Hajo Frerichs
Affiliation:
Quantum Design Microscopy GmbH, United States
Marion Wolff
Affiliation:
GETec Microscopy GmbH, United States
Robert Winkler
Affiliation:
Graz University of Technology, United States
Santiago Andany
Affiliation:
EPFL Lausanne, United States
Peter Hosemann
Affiliation:
University of California, Berkeley, United States
Gregor Hlawacek
Affiliation:
Helmholtz-Zentrum Dresden-Rossendorf, Dresden, Sachsen, Germany
Georg Fantner
Affiliation:
EPFL Lausanne, United States
Harald Plank
Affiliation:
Graz University of Technology, United States

Abstract

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Type
Advances in Focused Ion Beam Instrumentation, Applications and Techniques in and Materials and Life Sciences
Copyright
Copyright © The Author(s), 2021. Published by Cambridge University Press on behalf of the Microscopy Society of America

References

Yablon, D. et al. , Microscopy and Analysis 31(2) 14-18 (2017)Google Scholar
Kreith, J. et al. , Rev. Sci. Instr. 88 053704 (2017)CrossRefGoogle Scholar
Andany, S.H. et al. , Beilstein J. Nanotechnol. 11, 1272-1279 (2020)CrossRefGoogle Scholar