Hostname: page-component-84b7d79bbc-c654p Total loading time: 0 Render date: 2024-07-27T17:15:53.035Z Has data issue: false hasContentIssue false

Initial Oxidation Kinetics of Copper (110) Thin Films As Investigated By IN SITU UHV-TEM

Published online by Cambridge University Press:  02 July 2020

Guang-Wen Zhou
Affiliation:
Department of Materials Science and Engineering, University of Pittsburgh, Pittsburgh, PA, 15260.
Mridula D.Bharadwaj
Affiliation:
Department of Materials Science and Engineering, University of Pittsburgh, Pittsburgh, PA, 15260.
Judith C.Yang
Affiliation:
Department of Materials Science and Engineering, University of Pittsburgh, Pittsburgh, PA, 15260.
Get access

Abstract

In the study of metal oxidation, there is a wide gap between information provided by surface science methods and that provided by bulk oxidation studies. The former have mostly examined the adsorption of up to ∽1 monolayer (ML) of oxygen on the metal surface, where as both low and high temperature bulk oxidation studies have mainly focused on the growth of an oxide layer at the later stages of oxidation. Hence, we are visualizing the initial oxidation stages of a model metal system by in situ ultra-high vacuum (UHV) transmission electron microscopy (TEM), where the surfaces are atomically clean, in order to gain new understanding of these ambiguous stages of oxidation. We have previously studied the growth of Cu2O islands during initial oxidation of Cu(100) film. We are presently investigating the initial stages of Cu(110) oxidation, from 10−4 Torr O2 to atmospheric pressures and temperature range from room temperature to 700 °C.

Type
Oxidation/Corrosion
Copyright
Copyright © Microscopy Society of America 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

references

1.Yang, J.C., Yeadon, M., Kolasa, B. and Gibson, J.M.,Appl. Phys. Lett., 70, 26 (1997)Google Scholar
2.Yang, J.C.,Yeadon, M., Kolasa, B. and Gibson, J.M., Scripta Materalia, 38, 8 (1998)Google Scholar
3.Yang, J.C., Kolasa, B. and Gibson, J.M., Appl. Phys. Lett., 73, 19 (1998).Google Scholar
4.McDonald, M.L., Gibson, J.M. and Underwald, F.C., Rev. Sci. Instrum. 60, 700 (1989)CrossRefGoogle Scholar
5.Yang, J.C., Yeadon, M., Olynick, D. and Gibson, J.M., Microsc. Microanal. 3, 121 (1997)CrossRefGoogle Scholar