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Growth andIn SituCharacterization of Oxide Epitaxial Heterostructures with Atomic Plane Precision

Published online by Cambridge University Press:  25 July 2016

Q. He
Affiliation:
Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN
S. Jesse
Affiliation:
The Center for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN
A.R. Lupini
Affiliation:
Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN
M. Fuentes-Cabrera
Affiliation:
The Center for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN Computer Science and Mathematics Division, Oak Ridge National Laboratory, Oak Ridge, TN
B.G. Sumpter
Affiliation:
The Center for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN Computer Science and Mathematics Division, Oak Ridge National Laboratory, Oak Ridge, TN
A. Akbashev
Affiliation:
Department of Materials Science and Engineering, Drexel University, Philadelphia, PA
M. Falmbigl
Affiliation:
Department of Materials Science and Engineering, Drexel University, Philadelphia, PA
J. Spanier
Affiliation:
Department of Materials Science and Engineering, Drexel University, Philadelphia, PA
S. V. Kalinin
Affiliation:
The Center for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN
A.Y. Borisevich
Affiliation:
Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN The Center for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN

Abstract

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Type
Abstract
Copyright
© Microscopy Society of America 2016 

References

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[7] The research is sponsored by the Division of Materials Sciences and Engineering, Office of BasicEnergy Sciences, U.S. Department of Energy. BGS and MF-C were supported by the Center forNanophase Materials Sciences which is sponsored at Oak Ridge National Laboratory by the Office ofScience, Basic Energy Sciences, U.S. Department of Energy. Calculations made use of resources at theOak Ridge Leadership Computing Facility at the Oak Ridge National Laboratory, which is supported by the Office of Science of the U.S. Department of Energy under Contract DE-AC05-00OR22725.Google Scholar