Hostname: page-component-848d4c4894-cjp7w Total loading time: 0 Render date: 2024-06-22T22:43:34.449Z Has data issue: false hasContentIssue false
  • English
  • Français

Gas-Mediated Electron Beam Induced Etching - From Fundamental Physics to Device Fabrication

Published online by Cambridge University Press:  27 August 2014

A. A. Martin ,
I. Aharonovich  and
M. Toth
A. A. Martin
Affiliation:
School of Physics and Advanced Materials, University of Technology, Sydney, Australia
I. Aharonovich
Affiliation:
School of Physics and Advanced Materials, University of Technology, Sydney, Australia
M. Toth
Affiliation:
School of Physics and Advanced Materials, University of Technology, Sydney, Australia

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 20 , Supplement S3: Proceedings of Microscopy & Microanalysis 2014 , August 2014 , pp. 364 - 365
Copyright
Copyright © Microscopy Society of America 2014 

References

[1] “Nanofabrication Using Focused Ion and Electron Beams: Principles and Applications”, ed. I. Utke, S. Moshkalev, and P. Russell, (Oxford University Press, New York).Google Scholar
[2] Martin, A. A., Phillips, M., Toth, M. ACS Appl. Mater. Interfaces 5 (2013), p. 8002-8007.Google Scholar
[3] Lobo, C. J., Martin, A. A., Phillips, M. R., Toth, M. Nanotechnology 23 (2012), p. 375302.Google Scholar
[4] Acknowledgments: This work was partly funded by FEI Company. A. Martin is the recipient of a John Stocker Postgraduate Scholarship from the Science and Industry Endowment Fund. I. Aharonovich is the recipient of an Australian Research Council Discovery Early Career Research Award (Project Number DE130100592).Google Scholar