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Electrostatic Contribution to the Photo-Assisted Piezoresponse Force Microscopy by Photo-Induced Surface Charge

Published online by Cambridge University Press:  26 May 2022

Chin Chyi Loo Open the ORCID record for Chin Chyi Loo [Opens in a new window] ,
Sha Shiong Ng  and
Wei Sea Chang Open the ORCID record for Wei Sea Chang [Opens in a new window]
Chin Chyi Loo
Affiliation:
Mechanical Engineering Discipline, School of Engineering, Monash University, Bandar Sunway, Selangor 47500, Malaysia
Sha Shiong Ng
Affiliation:
Institute of Nano Optoelectronics Research and Technology (INOR), Universiti Sains Malaysia, 11800 USM, Penang, Malaysia
Wei Sea Chang*
Affiliation:
Mechanical Engineering Discipline, School of Engineering, Monash University, Bandar Sunway, Selangor 47500, Malaysia Department of Mechanical Engineering and Research Center for Intelligent Medical devices, Ming Chi University of Technology, New Taipei City 24301, Taiwan
*
*Corresponding author: Wei Sea Chang, E-mail: chang.wei.sea@monash.edu
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Abstract

The surging interest in manipulating the polarization of piezo/ferroelectric materials by means of light has driven an increasing number of studies toward their light-polarization interaction. One way to investigate such interaction is by performing piezoresponse force microscopy (PFM) while/after the sample is exposed to light illumination. However, caution must be exercised when analyzing and interpreting the data, as demonstrated in this paper, because sizeable photo-response observed in the PFM amplitude image of the sample is shown to be caused by the electrostatic interaction between the photo-induced surface charge and tip. Through photo-assisted Kelvin probe force microscopy (KPFM), positive surface potential is found to be developed near the sample's surface under 405 nm light illumination, whose effects on the measured PFM signal is revealed by the comparative studies on its amplitude curves that are obtained using PFM spectroscopy mode with/without illumination. This work exemplifies the need for complementary use of KPFM, PFM imaging mode, and PFM spectroscopy mode in order to distinguish real behavior from artifacts.

Keywords

atomic force microscopy (AFM)electrostaticsKelvin probe force microscopy (KPFM)photo-induced surface chargepiezoresponse force microscopy (PFM)
Type
Software and Instrumentation
Information
Microscopy and Microanalysis , Volume 28 , Issue 5 , October 2022 , pp. 1599 - 1603
Copyright
Copyright © The Author(s), 2022. Published by Cambridge University Press on behalf of the Microscopy Society of America

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