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Electron Energy-loss Spectroscopy Study on Boron Diffusion in Free Layer of Tunneling Magnetoresistance Thin Films with Ti Capping Layers

Published online by Cambridge University Press:  23 November 2012

L. Chen ,
C. Yang ,
Q. Leng  and
H. Wang
L. Chen
Affiliation:
Western Digital, Fremont, CA
C. Yang
Affiliation:
Western Digital, Fremont, CA
Q. Leng
Affiliation:
Western Digital, Fremont, CA
H. Wang
Affiliation:
Western Digital, Fremont, CA
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Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 18 , Issue S2: Proceedings of Microscopy & Microanalysis 2012 , July 2012 , pp. 1850 - 1851
Copyright
Copyright © Microscopy Society of America 2012

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