Hostname: page-component-77c89778f8-7drxs Total loading time: 0 Render date: 2024-07-22T13:16:49.387Z Has data issue: false hasContentIssue false

Dynamics Of Grain Boundary Space-Charge Potential In Electroceramics

Published online by Cambridge University Press:  02 July 2020

Kevin D. Johnson
Affiliation:
Department of Materials Science & Engineering, Northwestern University, Evanston, IL60208
Vinayak P. Dravid
Affiliation:
Department of Materials Science & Engineering, Northwestern University, Evanston, IL60208
Get access

Extract

A large number of bulk and thin-film electroceramic systems contain electrically active interfaces which dictate the various useful electronic properties of these devices. The electrical activity of these interfaces stems from a complex interplay among various interfacial attribute but often involves formation of some form of electrostatic potential at the interfaces which is modified under applied bias of current and/or voltage.

Figure la schematically shows charge distribution at a model grain boundary (GB), while Figure 1(b) shows its corresponding potential distribution. As shown in Figure 1(c), the energy band structure bends opposite to this built-in potential, causing a downward shift at the grain boundary . The difficulty with evaluating the Schottky barrier model, which is often invoked to explain GB electrical activity, is that the charge density distribution and therefore the band bending is expected to dynamically alter as bias is applied across the grain boundary. This variation adds another level of complexity to theoretical descriptions of the barrier behavior

Type
Atomic Structure And Microchemistry Of Interfaces
Copyright
Copyright © Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

References:

1.Blatter, G. and Greuter, F., Phys Rev B: 33: (1986) 3952,CrossRefGoogle Scholar
2.Sze, S. M.Physics of Semiconductor Devices. (1981) New York: John Wiley & Sons.Google Scholar
3.Johnson, Kevin D. and Dravid, Vinayak P., Appl. Phys. Lett.Google Scholar
4.Johnson, Kevin D. and Dravid, Vinayak P., Micro, and Microanal., under consideration, February 1999.Google Scholar
5.This research is supported by the Basic Science Division of the Department of Energy under grant number DE-FG02-92ER45475.Google Scholar