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Dual Beam Approach to Nano-Scale Defect Correction of High-End Photolithographic Masks

Published online by Cambridge University Press:  01 August 2005

J G Marshman ,
A A Graupera  and
M A Coy
J G Marshman
Affiliation:
FEI Company
A A Graupera
Affiliation:
FEI Company
M A Coy
Affiliation:
FEI Company

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

Type
Research Article
Information
Microscopy and Microanalysis , Volume 11 , Issue S02 , August 2005 , pp. 844 - 845
Copyright
© 2005 Microscopy Society of America