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Direct Imaging of Microstructural Changes in Si Induced by FIB-Patterning with Si++ and Ga+ Ions

Published online by Cambridge University Press:  08 April 2017

S Chee
Affiliation:
Rensselaer Polytechnic Institute
M Kammler
Affiliation:
Universität Duisburg-Essen, Germany
J Graham
Affiliation:
University of Virginia
F Ross
Affiliation:
IBM T J Watson Research Center
R Hull
Affiliation:
Rensselaer Polytechnic Institute

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.

Type
Abstract
Copyright
Copyright © Microscopy Society of America 2011