Hostname: page-component-76fb5796d-qxdb6 Total loading time: 0 Render date: 2024-04-26T09:45:57.468Z Has data issue: false hasContentIssue false
  • English
  • Français

Atomic Scale Imaging and High Sensitive Elemental Analysis with an Aberration Corrected Dedicated STEM

Published online by Cambridge University Press:  05 August 2007

K Nakamura ,
H Inada ,
H Tanaka ,
M Konno  and
T Yaguchi
K Nakamura
Affiliation:
Hitachi High-Technologies Corporation,Japan
H Inada
Affiliation:
Hitachi High-Technologies Corporation,Japan
H Tanaka
Affiliation:
Hitachi High-Technologies Corporation,Japan
M Konno
Affiliation:
Hitachi High-Technologies Corporation,Japan
T Yaguchi
Affiliation:
Hitachi High-Technologies Corporation,Japan
Get access

Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2007 in Ft. Lauderdale, Florida, USA, August 5 – August 9, 2007

Type
Research Article
Information
Microscopy and Microanalysis , Volume 13 , Issue S02 , August 2007 , pp. 886 - 887
Copyright
© 2007 Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)