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Application of Focused Helium Ion Beams for Direct-write Lithography of Superconducting Electronics

Published online by Cambridge University Press:  23 September 2015

Shane Cybart
Affiliation:
Oxide Nano Electronics Laboratory, Department of Physics, University of California San Diego, USA.
E. Y. Cho
Affiliation:
Oxide Nano Electronics Laboratory, Department of Physics, University of California San Diego, USA.
B. H. Wehlin
Affiliation:
Oxide Nano Electronics Laboratory, Department of Physics, University of California San Diego, USA.
Meng Ma
Affiliation:
Oxide Nano Electronics Laboratory, Department of Physics, University of California San Diego, USA.
T. J. Wong
Affiliation:
Oxide Nano Electronics Laboratory, Department of Physics, University of California San Diego, USA.
R. C. Dynes
Affiliation:
Oxide Nano Electronics Laboratory, Department of Physics, University of California San Diego, USA.
Chuong Huynh
Affiliation:
Carl Zeiss Microscopy, LLC., One Corporation Way, Peabody, MA, USA.
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Copyright © Microscopy Society of America 2015 

References

[1] Ward, B. W., Notte, J. A. & Economou, N. P., J. Vac. Sci. Technol., B 24 (2006).CrossRefGoogle Scholar
[2] Cybart, S. A., et al, arXiv: 1409.4876 http://arxiv.org/abs/1409.4876 (2014).Google Scholar
[3] Valles, J. M., et al, Phys. Rev. B. 39 (1989). p. 11599.CrossRefGoogle Scholar
[4] The authors gratefully acknowledge Garrett Schlenvogt for help with ion implantation simulations. This work was funded by the Air Force Office of Scientific Research and the UC Scholars Program..Google Scholar
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