Hostname: page-component-84b7d79bbc-fnpn6 Total loading time: 0 Render date: 2024-07-28T15:27:26.575Z Has data issue: false hasContentIssue false
  • English
  • Français

AN ELECTRON MIRROR AS AN OBJECTIVE LENS OF THE TRANSMISSION ELECTRON MICROSCOPE

Published online by Cambridge University Press:  30 July 2021

Seitkerim Bimurzaev  and
Yevgeniy Yakushev
Seitkerim Bimurzaev
Affiliation:
G. Daukeev Almaty University of Power Engineering and Telecommunications, Almaty, Kazakhstan
Yevgeniy Yakushev
Affiliation:
G. Daukeev Almaty University of Power Engineering and Telecommunications, Almaty, Kazakhstan

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Advances in Analytical STEM-in-SEM
Information
Microscopy and Microanalysis , Volume 27 , Supplement S1 , August 2021 , pp. 1600 - 1601
Check for updates
Copyright
Copyright © The Author(s), 2021. Published by Cambridge University Press on behalf of the Microscopy Society of America

References

Hawkes, P.W. and Kasper, E.. Principles of Electron Optics. Academic Press, 1989.Google Scholar
Krivanek, O.L., Nellist, P.D., Dellby, N., Mur_tt, M.F., and Szilagyi, Z.. Towards sub-0.5 Å electron beams. Ultramicroscopy, 96(3): 229–237, 2003.Google ScholarPubMed
Hartel, P., Preikszas, D., Spehr, R., Muller, H., and Rose, H.. Mirror corrector for low-voltage electron microscopes. Advances in Imaging and Electron Physics, 120: 41--133. Elsevier, 2003.CrossRefGoogle Scholar
Haider, M., Rose, H., Uhlemann, S., Schwan, E., Kabius, B., and Urban, K.. A spherical-aberration-corrected 200 kv transmission electron microscope. Ultramicroscopy, 75(1): 53--60, 1998.CrossRefGoogle Scholar
Haider, M., Muller, H., Uhlemann, S., Zach, J., Loebau, U., and Hoeschen, R.. Prerequisites for a cc/cs-corrected ultrahigh-resolution tem. Ultramicroscopy, 108(3): 167--178, 2008.CrossRefGoogle ScholarPubMed
Muller, H., Uhlemann, S., Haider, M., Hartel, P. and Zach, J.. Current and future aberration correctors for the improvement of resolution in electron microscopy. Trans. R. Soc. A., 367(1): 3665--3682, 2009.Google Scholar
Tromp, R.M., Hannon, J.B., Ellis, A.W., Wan, W., Berghaus, A., and Schaff, O.. A new aberration-corrected, energy-filtered leem/peem instrument. i. Principles and design. Ultramicroscopy, 110 (7): 852--861, 2010.CrossRefGoogle ScholarPubMed
Tromp, R.M., Hannon, J.B., Wan, W., Berghaus, A., and Schaff, O.. A new aberration-corrected, energy-filtered leem/peem instrument. ii. Operation and results. Ultramicroscopy, 127: 25--39, 2013.CrossRefGoogle ScholarPubMed
Bimurzaev, S.B., Serikbaeva, G.S. and Yakushev, E.M.. Electrostatic Mirror Objective with Eliminated Spherical and Axial Chromatic Aberrations. J. Electron Microscopy, 2003, 52(4): P.365-368.Google ScholarPubMed