Hostname: page-component-7bb8b95d7b-dvmhs Total loading time: 0 Render date: 2024-09-05T20:17:01.604Z Has data issue: false hasContentIssue false
  • English
  • Français

The Optimum CS Condition for High-Resolution Transmission Electron Microscopy

Published online by Cambridge University Press:  02 July 2020

Michael A. O'Keefe
Michael A. O'Keefe*
Affiliation:
National Center for Electron Microscopy, MSD, LBNL B72, Berkeley, CA94720
Get access

Extract

High-resolution electron microscopists are familiar with the concept of an “optimum defocus” for obtaining highresolution transmission electron microscope images. Scherzer recognized that it is possible to balance the phase changes imposed by the spherical aberration of the TEM objective lens by adjustments to lens defocus. Selection of this focus condition maximizes the same-phase transfer of structural information carried by electrons scattered from the specimen. The upper limit of spatial frequencies transferred with the same phase change determines the resolution of the microscope. The resolution and “optimum defocus” depend only on the electron wavelength of the microscope and the spherical aberration coefficient, CS, of its objective lens. Reduction of Cs is the major route to improved resolution.

With the advent of electron-optical systems able to generate negative spherical aberration (usually called “Cs correctors“), it has now become feasible to zero-out objective lens Cs in the high-resolution transmission electron microscope.

Type
High Resolution Electron Microscopy
Information
Microscopy and Microanalysis , Volume 6 , Issue S2: Proceedings: Microscopy & Microanalysis 2000, Microscopy Society of America 58th Annual Meeting, Microbeam Analysis Society 34th Annual Meeting, Microscopical Society of Canada/Societe de Microscopie de Canada 27th Annual Meeting, Philadelphia, Pennsylvania August 13-17, 2000 , August 2000 , pp. 1036 - 1037
Copyright
Copyright © Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Scherzer, O., J. Appl. Phys. 20 (1949) 20.CrossRefGoogle Scholar
Rose, H., Optik 85 (1990) 19.Google Scholar
Haider, M. and Uhlemann, S., Proc. 55th Ann. Meeting MSA, Cleveland, Ohio (1997) 1179.Google Scholar
O'Keefe, M.A., Proc. 56th Ann. Meeting MSA, Atlanta, Georgia (1998) 382.Google Scholar
O'Keefe, M.A., Ultramicroscopy 47 (1992) 282.CrossRefGoogle Scholar
O'Keefe, M.A., LBL Symposium on Microstructures of Materials, ed. Krishnan, K. (1993) 121.Google Scholar
O'Keefe, M.A. and Kisielowski, C., these proceedings, and Ultramicroscopy (submitted).Google Scholar
Work supported by Director, Office of Science, Office of Basic Energy Sciences, Material Sciences Division, of the U.S. Department of Energy, under contract No. DE-AC03-76SF00098.Google Scholar