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The New Form Of The Zeta-Factor Method For Quantitative Microanalysis In Aem-Xeds And Its Evaluation

Published online by Cambridge University Press:  02 July 2020

M. Watanabe  and
D. B. Williams
M. Watanabe
Affiliation:
*Research Lab. for High Voltage Electron Microscopy, Kyushu University, Fukuoka, 812-8581, JAPAN.
D. B. Williams
Affiliation:
Department of Materials Science and Engineering, Lehigh University, Bethlehem, PA18015, USA.
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Extract

For quantitative thin-film microanalysis using X-ray energy dispersive spectrometry (XEDS) in analytical electron microscopy (AEM) the Cliff-Lorimer ratio technique is widely applied. One of the critical steps in the ratio technique is to determine the aiff-Lorimer k factor relating the characteristic X-ray intensities to the compositions. The k factor can be determined experimentally with the relative error of ˜ ± 1%. So, the most accurate quantification can be performed using the experimental k factors. To determine the k factors experimentally, standard thin-filrns with known composition are required. Unfortunately, this is not always possible because such the standards may not be available. Even if all standards are available, many k factors should be determined in multi-component system. This is time consuming. These limitations in k-factor determination make thin-film quantification harder. This paper presents a new quantitative procedure for thin specimens to overcome these limitations.

Type
Quantitative X-Ray Microanalysis
Information
Microscopy and Microanalysis , Volume 5 , Issue S2: Proceedings: Microscopy & Microanalysis '99, Microscopy Society of America 57th Annual Meeting, Microbeam Analysis Society 33rd Annual Meeting, Portland, Oregon August 1-5, 1999 , August 1999 , pp. 88 - 89
Copyright
Copyright © Microscopy Society of America

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References

1.Cliff, G and Lorimer, G W., J. Micmscopy, 103 (1975)203.CrossRefGoogle Scholar
2.Watanabe, M. et al., Ultramicwscopy, 65 (1996)187.CrossRefGoogle Scholar
3.Certificates of Analysis for SRM 2063 and SRM 2063a. Mere-analysis Thin Film Mg-Si-Ca-Fe, Standard Reference Materials Program NBT, Gaithersburg, MD20899.Google Scholar
4.Zemyan, S. M. and Williams, D. B., J. Microscopy, (submitted).Google Scholar
5.Press, W. H. et al., Numerical Recipes in C 2nd Ed., Cambridge University Press (1992)408.Google Scholar
6.The authors acknowledge the support of Bettis Labs Westinghouse.Google Scholar