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Spectroscopic studies of laser ablated ZnO plasma and correlation with pulsed laser deposited ZnO thin film properties

Published online by Cambridge University Press:  14 April 2010

Gaurav Shukla  and
Alika Khare
Gaurav Shukla
Affiliation:
Department of Physics, Indian Institute of Technology Guwahati, Guwahati, India
Alika Khare*
Affiliation:
Department of Physics, Indian Institute of Technology Guwahati, Guwahati, India
*
Address correspondence and reprint requests to: Alika Khare, Department of Physics, Indian Institute of Technology Guwahati, Guwahati-781039, India. E-mail: alika@iitg.ernet.in
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Abstract

In this paper, measurement of various plasma parameters during pulsed laser deposition of ZnO thin films on Si (100) substrates is reported. The variations of electron number density and electron temperature with ambient pressure and target substrate distance is obtained via spectroscopic measurements. The structural and optical properties of ZnO thin films were analyzed using X-ray diffraction, scanning electron microscope, and photoluminescence and then correlated with spectroscopic results to find optimum conditions for the deposition of high quality ZnO thin films.

Keywords

Laser ablationOptical emission spectroscopyZnOThin filmPulsed laser deposition
Type
Research Article
Information
Laser and Particle Beams , Volume 28 , Issue 1 , March 2010 , pp. 149 - 155
Copyright
Copyright © Cambridge University Press 2010

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