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Optimized four-channel Nd: glass laser system for compression experiments

Published online by Cambridge University Press:  09 March 2009

S. Denus
Affiliation:
Kaliski Institute of Plasma Physics and Laser Microfusion, P.O. Box 49, 00-908 Warsaw, Poland
A. Dubik
Affiliation:
Kaliski Institute of Plasma Physics and Laser Microfusion, P.O. Box 49, 00-908 Warsaw, Poland
B. Kaczmarczyk
Affiliation:
Kaliski Institute of Plasma Physics and Laser Microfusion, P.O. Box 49, 00-908 Warsaw, Poland
J. Makowski
Affiliation:
Kaliski Institute of Plasma Physics and Laser Microfusion, P.O. Box 49, 00-908 Warsaw, Poland
J. Marczak
Affiliation:
Kaliski Institute of Plasma Physics and Laser Microfusion, P.O. Box 49, 00-908 Warsaw, Poland
J. Owsik
Affiliation:
Kaliski Institute of Plasma Physics and Laser Microfusion, P.O. Box 49, 00-908 Warsaw, Poland
Z. Patron
Affiliation:
Kaliski Institute of Plasma Physics and Laser Microfusion, P.O. Box 49, 00-908 Warsaw, Poland
M. Szczurek
Affiliation:
Kaliski Institute of Plasma Physics and Laser Microfusion, P.O. Box 49, 00-908 Warsaw, Poland

Abstract

This paper presents the design of the four-channel Nd: glass high power laser system in the Kaliski Institute of Plasma Physics and Laser Microfusion (IPPLM) in its optimized version, based on a theoretical analysis of propagation of radiation in the real laser channel.

Type
Research Article
Copyright
Copyright © Cambridge University Press 1986

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References

Babiczenko, S. M., Bykowskij, H. E. & Senatskij, J. W. 1982 1982 1, 161.Google Scholar
Baranovan, B., Bykowskij, N. E., Zeldowicz, B. A. & Senatskij, J. W. 1974 Quantum Electronic, 1, 2433.Google Scholar
Bliss, E. S., Hunt, J. T., Reward, P. A., Sommargren, G. E. & Weaver, H. J. 1976 IEEE Quantum Electronics, 12, 402.CrossRefGoogle Scholar
Brannon, P. J., Franklin, F. R., Hauser, G. C.Lavasek, J. W. & Jones, E. D. 1974 Appl. Opt. 13, 1555.CrossRefGoogle Scholar
Brodow, H. E., Kamieniec, F. F., Korobkin, W. W., Prochorow, A. M. & Sierow, R. W. 1979 Quantum Electronic, 6, 377.Google Scholar
Campillo, A. J., Pearson, J. E., Shapiro, S. L. & Tewell, N. J. 1973 Appl. Phys. Lett. 23, 88.Google Scholar
Campillo, A. J. 1973 Appl. Phys. Lett. 23, 15.Google Scholar
Campillo, A. J., Carpenter, B., Newman, B. E. & Shapiro, S. L. 1974 Optics Comm. 10, 4.CrossRefGoogle Scholar
Chiodzin`ski, J., Dubik, A., Flrak, J., Marczak, J., Owsik, J., Patron, Z., Rycyk, A. & Szczurek, M. 1981 J. Techn. Phys. 2, 131.Google Scholar
Cooke, R. L., Norman, C. J. & Danson, C. D. 1983 SPIE V, 343.Google Scholar
Costich, V. R., Johnson, B. C. 1974 Laser Focus.Google Scholar
Denus, S., Cesarz, T., Farny, J., Fiedorowicz, H. & Godzik, J. 1981 J. Techn. Phys. 22, 103.Google Scholar
Diels, J. C. 1975 Appl. Opt. 14, 12.CrossRefGoogle Scholar
Dubik, A. 1978a J. Techn. Phys. 2, 235.Google Scholar
Dubik, A. 1978b J. Techn. Phys. 2, 257.Google Scholar
Dubik, A. & Kielesin`ski, M. 1978C J. Techn. Phys. 3, 32.Google Scholar
Dubik, A. & Firak, J. 1978d J. Techn. Phys. 3, 383.Google Scholar
Dubik, A., Jach, K. & Owsik, J. 1979 J. Techn. Phys. 1, 63.Google Scholar
Dubik, A., Jach, K. & Owsik, J. 1980 Optica Applicata, 3, 219.Google Scholar
Dubik, A. & Jach, K. 1980a J. Techn. Phys. 2, 161.Google Scholar
Dubik, A., Jach, K. & Badziak, J. 1980b J. Techn. Phys. 4, 441.Google Scholar
Dubik, A. 1981 J. Techn. Phys. 1, 3.Google Scholar
Dubik, A. 1982 J. Techn. Phys. 3, 299.Google Scholar
Dubik, A. & Szczurek, M. 1984a J. Techn. Phys. 2, 257.Google Scholar
Dubik, A. & Szczurek, M. 1984b J. Techn. Phys. 2, 265.Google Scholar
Dubik, A. & Sarzyn`ski, A. 1984c J. Techn. Phys. 3, 441.Google Scholar
Dubik, A., Firak, J. & Jach, K. 1980 IPPLM Report, 4, 24.Google Scholar
Faryn`ski, A., Karpin`ski, L., Nowak, A. & Owsik, J. 1980 IPPLM Report, 16, 36.Google Scholar
Feldman, B. J. & Gitomer, S. J. 1976 Appl. Opt. 15, 1379.CrossRefGoogle Scholar
Fleck, J. & Layne, C. 1973 Appl. Phys. Lett. 22, 476.Google Scholar
Fong, P. K. 1979 The Rev. of Scient. Instr. F41, 10, 1434.Google Scholar
Glass, A. J. & Geunter, A. H. 1973 NBS Spec. Publ. 387.Google Scholar
Glaze, J. 1976 Optical Engineering, 2, 118.Google Scholar
Guyot, J. G., Bettinger, A. & Aurie, D. 1978, Revue de Physique Applique, 13, 198.Google Scholar
Hadley, G. R. 1974 IEEE Journ. of Quant. Electr. V.Q.E. 10, 8, 603.Google Scholar
Hunt, J. T. & Renard, P. A. & Simmons, W. S. 1977 Appl. Opt. 16, 779.CrossRefGoogle Scholar
Hunt, J. T.Glaze, J. A., Simmons, W. W. & Renard, P. A. 1978 Appl. Opt. 17, 2053.CrossRefGoogle Scholar
Kaliski, S., Denus, S., Dubik, A., Nagraba, S., SzypuŁa, W., Wodnicki, R., WoŁowski, J. & Zadrozny, J. 1979 J. Techn. Phys. 20, 1.Google Scholar
Kaliski, S., Denus, S., Godzik, J., Farny, J., Fiedorowicz, H., Szypula, W.& WoŁtowski, J. 1980 J. Techn. Phys. 21, 1.Google Scholar
Kelly, P. L. 1965 Phys. Rev. Lett. 15.Google Scholar
Krasjuk, I. K., łukiszowa, S. G., Paszinin, P. P., Prochorow, A. M. & Szirkow, A. W. 1976 Quantum Electronics, 3, 6.Google Scholar
Laser Program Annual Report 1974 N.L.L.L. 169.Google Scholar
Laser Program Annual Report 1976 N.L.L.L.Google Scholar
Marczak, J., Rycyk, A. & Szczurek, M. 1985 Optica Applicata.Google Scholar
Penzkofer, A. & Frohlich, W. 1978 Opt. Commun. 2, 197.Google Scholar
Ree, E. W. S. 1975 Optics and Laser Technology.Google Scholar
Seka, W., Soures, J., Lewis, , Bumkenburg, J., Brown, D., Jacobs, S., Mourou, G. & Zimmermann, J. 1980 Apl. Opt. 3, 409.CrossRefGoogle Scholar
Fian, Trudy. 1978 103, 8.Google Scholar
Własow, S. N. & Jaszyn, W. E. 1981 1981 8, 510.Google Scholar