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Neoclassical thermal conductivity in ICP plasma at low pressure

Published online by Cambridge University Press:  01 June 2008

A.P. SMIRNOV
Affiliation:
Department of Computational Mathematics and Cybernetics, Moscow State University, Vorobievy Gory, Moscow 119899, Russia (sap@cs.msu.su)
W. PARK
Affiliation:
Mechatronics and Manufacturing Technology Center, Samsung Electronics Co., Ltd., 416 Maetan-3Dong, Suwon City, Kyunggi-do 443-742, Korea
YA.N. ISTOMIN
Affiliation:
Lebedev Physical Institute, Leninsky Prosp. 53, Moscow 119991, Russia
D.P. KOSTOMAROV
Affiliation:
Department of Computational Mathematics and Cybernetics, Moscow State University, Vorobievy Gory, Moscow 119899, Russia (sap@cs.msu.su)
E.A. SHEINA
Affiliation:
Department of Computational Mathematics and Cybernetics, Moscow State University, Vorobievy Gory, Moscow 119899, Russia (sap@cs.msu.su)
A. B. SHMLEV
Affiliation:
Department of Computational Mathematics and Cybernetics, Moscow State University, Vorobievy Gory, Moscow 119899, Russia (sap@cs.msu.su)
V. N. VOLYNETS
Affiliation:
Mechatronics and Manufacturing Technology Center, Samsung Electronics Co., Ltd., 416 Maetan-3Dong, Suwon City, Kyunggi-do 443-742, Korea

Abstract

The plasma temperature in a new plasma source shows unusual behaviour at low pressures (about 1 mTorr) and high absorbed powers. In Ar plasma at pressures of about 1 mTorr, the electron temperature shows a pronounced maximum inside an electromagnetic accelerator, which is followed by a rapid drop at the boundary between the accelerator region and the main chamber. In this paper a neoclassical thermo-conductivity model based on the analysis of the electron trajectories is proposed to describe the sharp electron temperature profile. Quantitative agreement of the calculated temperature profile with the experiment is observed.

Type
Papers
Copyright
Copyright © Cambridge University Press 2007

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References

[1]Schaepkens, M. and Oehrlein, G. S. 2001 A review of SiO2 etching studies in inductively coupled plasmas. J. Electrochem. Soc. 148, C211C221.CrossRefGoogle Scholar
[2]Cohen, S. A., Siefert, N. S., Stange, S., Boivin, R. F., Scime, E. E. and Leninton, F. M. 2003 Ion acceleration in plasmas emerging from a helicon-heated magnetic-mirror device. Phys. Plasmas. 10, 25932598.CrossRefGoogle Scholar
[3]Charles, C. and Boswell, R. W. 2004 Laboratory evidence of a supersonic ion beam generated by a current-free ‘helicon’ double-layer Phys. Plasmas. 11, 17061714.CrossRefGoogle Scholar
[4]Sun, X., Biloiu, C., Hardin, R. and Scime, E. E. 2004 Parallel velocity and temperature of argon ions in an expanding, helicon source driven plasma. Plasma Sources Sci. Technol. 13, 359370.CrossRefGoogle Scholar
[5]Plihon, N., Corr, C. S. and Chabert, P. 2005 Double layer formation in the expanding region of an inductively coupled electronegative plasma. Appl. Phys. Lett. 86, 091501.CrossRefGoogle Scholar
[6]Lieberman, M. A. and Lichtenberg, A. J. 2005 Principals of Plasma Discharges and Material Processing, 2nd edn.New York: Wiley.CrossRefGoogle Scholar
[7]Vahedi, V., Lieberman, M. A., DiPeso, G., Rognlien, T. D. and Hewett, D. 1995 Analytic model of power deposition in inductively coupled plasma sources J. Appl. Phys., 78, 14461458.CrossRefGoogle Scholar
[8]Vasenkov, A. V. and Kushner, M. J. 2002 Electron energy distributions and anomalous skin depth effects in high-plasma-density inductively coupled discharges. Phys. Rev. E 66, 066411.Google ScholarPubMed
[9]Godyak, V. 2003 Plasma phenomena in inductively discharges. Plasma Phys. Control. Fusion 45, A399A424.CrossRefGoogle Scholar
[10]Vasenkov, A. V. and Kushner, M. J. 2003 Angular anisotropy of electron distributions in inductively coupled plasmas. J. Appl. Phys. 94, 55225529.CrossRefGoogle Scholar
[11]Volynets, V. N., Park, W., Tolmachev, Yu. N., Pashkovsky, V. G. and Yoo, J.-W. 2006 Spatial variation of plasma parameters and ion acceleration in an inductively plasma system. J. Appl. Phys. 99, 043302.CrossRefGoogle Scholar
[12]Galeev, A. A. and Sagdeev, R. Z. 1968 Transport phenomena in a collisionless plasma in a toroidal magnetic system. Sov. Phys.–JETP 26, 233240.Google Scholar