Hostname: page-component-848d4c4894-v5vhk Total loading time: 0 Render date: 2024-06-25T09:44:35.716Z Has data issue: false hasContentIssue false
  • English
  • Français

An Improved Two-Load Method for Whole-Field Complete Photoelastic Fringe Analysis

Published online by Cambridge University Press:  05 May 2011

T. Y. Chen ,
H. L. Lee  and
Y. C. Chou
T. Y. Chen*
Affiliation:
Department of Mechanical Engineering, National Cheng Kung University, Tainan, Taiwan 701, R.O.C.
H. L. Lee*
Affiliation:
Department of Mechanical Engineering, National Cheng Kung University, Tainan, Taiwan 701, R.O.C.
Y. C. Chou*
Affiliation:
Department of Mechanical Engineering, National Cheng Kung University, Tainan, Taiwan 701, R.O.C.
*
* Professor
** Graduate student
** Graduate student
Get access

Abstract

An improved two-load method for whole-field complete determination of photoelastic parameters is presented. The dark-field isoclinic images are used to determine the isoclinic angles. Using two isoclinic maps obtained from two different loads effectively compensates the indeterminable points. The use of dark-field and light-field photoelastic images for normalization extends the two-load method to analyze dark-field photoelastic fringe patterns and avoids model movement. Larger errors on the determined fringe orders are further reduced by a least-squares quadric fitting. The results are compared well to the theoretical ones. Further comparison of the improved two-load method and the two-wavelength method are given.

Keywords

PhotoelasticityIsoclinicsIsochromatic fringe orderTwo-load method
Type
Technical Note
Information
Journal of Mechanics , Volume 21 , Issue 3 , September 2005 , pp. 199 - 203
Copyright
Copyright © The Society of Theoretical and Applied Mechanics, R.O.C. 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Chen, T. Y., “Recent Advances in Digital Photoelasticity,” Trends in Optical Nondestructive Testing and Inspection, Rastogi, and Inaudi, , eds., Elsevier Science, pp. 533–544 (2000).Google Scholar
2.Voloshin, A. S. and Burger, C. P., “Half-Fringe Photoelasticity: A New Approach to the Whole Field Stress Analysis,” Exp. Mech., 23(3), pp. 304–313 (1983).CrossRefGoogle Scholar
3.Ajovalasit, A., Barone, S. and Petrucci, G., “Toward RGB Photoelasticity: Full-Field Automated Photoelasticity in White Light,” Exp. Mech., 35(2), pp. 193–200 (1995).CrossRefGoogle Scholar
4.Patterson, E. A. and Wang, Z. F., “Toward Full-Field Automated Photoelastic Analysis of Complex Components,” Strain, 27, pp. 49–56 (1991).Google Scholar
5.Chen, T. Y., “Digital Determination of Photoelastic Birefringence Using Two Wavelengths,” Exp. Mech., 37(3), pp. 232–236 (1997).CrossRefGoogle Scholar
6.Chen, T. Y., “A Simple Method for the Digital Determination of the Photoelastic Fringe Order,” Exp. Mech., 40, pp. 256–260 (2000).CrossRefGoogle Scholar
7.Asundi, A., Liu, T. and Boay, C. H., “Determination of Isoclinic and Isochromatic Parameters Using the Three-Load Method,” Meas. Sci. Technol., 11, pp. 532–537 (2000).Google Scholar
8.Buckberry, C. and Towers, D., “New Approaches to the Full-Field Analysis of Photoelastic Stress Patterns,” Opt. Lasers Engng., 24, pp. 415–428 (1996).CrossRefGoogle Scholar
9.Chen, T. Y. and Lin, C. H. “Whole-Field Digital Measurement of Principal Stress Directions in Photoelasticity,” Opt. Lasers Engng., 30, pp. 527–537 (1998).CrossRefGoogle Scholar
10.Chen, T. Y. and Lee, H. L., “Complete Analysis of Photoelastic Fringe Patterns Using Two Wavelengths,” J. of Chinese Soc. of Mech. Engrs., 23(6), pp. 559–565 (2002).Google Scholar