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Waveguide refractometry as a probe of thin film optical uniformity

Published online by Cambridge University Press:  31 January 2011

B. G. Potter Jr. ,
D. Dimos  and
M. B. Sinclair
B. G. Potter Jr.
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185–1349
D. Dimos
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185–1349
M. B. Sinclair
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185–1349
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Abstract

Optical inhomogeneities through the thickness of a sol-gel-derived, spin-coated Pb(Zr,Ti)O3 (PZT) thin film have been evaluated using prism-coupled waveguide refractometry. Unusual waveguide coupling angle behavior has been treated using a multilayer model to describe the optical characteristics of the film. Waveguide refractometry measurements, performed after incremental reductions in film thickness, were used to develop a consistent model for optical inhomogeneity through the film thickness. Specifically, a thin film layer model, consisting of alternating layers of high and low refractive index material, was found to accurately predict irregularities in transverse-electric (TE) mode coupling angles exhibited by the film. This layer structure has a spatial periodicity that is consistent with the positions of the upper film surface at intermediate firings during film synthesis. The correlation emphasizes the impact of the multistep thin-film deposition approach on the optical characteristics of the resulting thin film.

Type
Articles
Information
Journal of Materials Research , Volume 12 , Issue 2 , February 1997 , pp. 546 - 551
Copyright
Copyright © Materials Research Society 1997

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References

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