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Two critical thicknesses in the preferred orientation of TiN thin film

Published online by Cambridge University Press:  31 January 2011

U. C. Oh ,
Jung Ho Je  and
Jeong Y. Lee
U. C. Oh
Affiliation:
Department of Materials Science and Engineering, Pohang University of Science –784, Korea
Jung Ho Je*
Affiliation:
Department of Materials Science and Engineering, Pohang University of Science –784, Korea
Jeong Y. Lee
Affiliation:
Department of Materials Science and Engineering, Korea Advanced Institute of Science ' 1998
*
a)Corresponding author
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Abstract

The preferred orientation of the TiN film grown by sputter-deposition was studied by the cross-sectional TEM. The preferred orientation was changed from the (200) through the (110), and then finally to the (111) with the film thickness. The cross-sectional microstructure also shows that the film consists of three layers which are all columnar structure. The (111) preferred orientation was observed in the top layer, and the (110) in the middle layer, and finally the (200) in the bottom layer. It is very surprising that the (110) preferred orientation could be observed in a medium thickness region and there are two kinds of critical thicknesses. These results surely show the strong dependence of the change in the preferred orientation on the strain energy in TiN thin films.

Type
Articles
Information
Journal of Materials Research , Volume 13 , Issue 5 , May 1998 , pp. 1225 - 1229
Copyright
Copyright © Materials Research Society 1998

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