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The study on charge-density distribution in TiAl by quantitative electron crystallography method

  • Yu Miao (a1), Jing Zhu (a1), X.W. Lin (a1) and W.J. Jiang (a2)

Abstract

Structure factors of μ-TiAl equiaxed grain in TiAl duplex intermetallic compound before and after V-alloying were measured by the quantitative electron crystallography method. Then the structure factors were transferred into charge-density distributions of real space. Comparing the charge-density distributions in γ-TiAl with those in V-alloyed γ-TiAl, it was found that V-alloying with the optimum amount decreases the electronic charge density in the Ti-Ti interatomic bond, and increases the electronic charge density in the Al-Al interatomic bond and Ti-Al interatomic bond. Thus, the anisotropy of charge-density distribution in γ-TiAl equiaxed grain is reduced.

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References

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1Spence, J. C.H. and Zuo, J. M., Electron Microdiffraction (Plenum Press, New York, 1992).
2Gjønnes, J. and Høier, R., Acta Crystallogr, A 27, 313 (1971).
3Miao, Yu, Master Thesis, Central Iron and Steel Research Institute, Beijing, China (1993, Chinese Edition).
4Fletcher, R., The Computer Journal 13, 317 (1970).
5Anisimov, V. I., Fiz. Met. Metalloved. [Phys. Met. Metallogr. (USSR)] 63, 414 (1987).

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