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Novel route for the epitaxial growth of (SrBa)Nb2O6 thick films by the sol-gel method using a self-template layer

Published online by Cambridge University Press:  31 January 2011

A-D. Li ,
C. L. Mak ,
K. H. Wong ,
D. Wu  and
Naiben Ming
A-D. Li*
Affiliation:
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hung Hom, Hong Kong, and National Laboratory of Solid State Microstructures and Materials Science and Engineering Department, Nanjing University, Nanjing 210093, People's Republic of China
C. L. Mak
Affiliation:
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hung Hom, Hong Kong
K. H. Wong
Affiliation:
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hung Hom, Hong Kong
D. Wu
Affiliation:
National Laboratory of Solid State Microstructures and Materials Science and Engineering Department, Nanjing University, Nanjing 210093, People's Republic of China
Naiben Ming
Affiliation:
National Laboratory of Solid State Microstructures and Materials Science and Engineering Department, Nanjing University, Nanjing 210093, People's Republic of China
*
a) Address all correspondence to this author. National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, People's Republic of China. e-mail: adli@netra.nju.edu.cn
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Abstract

A novel sol-gel processing method has been developed to fabricate epitaxial (SrBa)Nb2O6 (SBN) thin films on MgO substrates. It involves the introduction of a SBN self-template layer on MgO by pulsed laser deposition (PLD). Effects of the SBN self-template layer on the structural and morphological properties of the sol-gel-derived SBN films were investigated. Compared to the sol-gel-derived SBN films without a self-template layer, our new technique produces SBN films of excellent epitaxy and more dense grains with uniform distribution. This can be explained by the self-template-layer-induced homoepitaxial growth. The innovative processing method with combination of PLD and sol-gel is a promising technique in preparing high-quality, thick epitaxial SBN films for electro-optics device applications.

Type
Articles
Information
Journal of Materials Research , Volume 16 , Issue 11 , November 2001 , pp. 3179 - 3183
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

1.Hisaka, M., Ishitobi, H., and Kawata, S., J. Opt. Soc. Am. B 17, 1422 (2000).CrossRefGoogle Scholar
2.Xu, Y.H., Chen, C.J., Xu, R., and Mackenzie, J.D., Phys. Rev. B 44, 35 (1991).CrossRefGoogle Scholar
3.Sakamoto, W., Yogo, T., Kikuta, K., Ogiso, K.J., Kawase, A., and Hirano, S.I., J. Am. Ceram. Soc. 79, 2283 (1996).CrossRefGoogle Scholar
4.Xu, Y.H., Ferroelectric Materials and Their Application (North-Holland, Amsterdam, The Netherlands, 1991), pp. 254–262.Google Scholar
5.Li, S.T., Liu, G.K., Liu, H., and Fernandez, F.E., J. Alloys Compd. 303–304, 360 (2000).Google Scholar
6.Megumi, K., Nagatsuma, N., and Furuhata, Y., J. Mater. Sci. 11, 1583 (1976).CrossRefGoogle Scholar
7.Thony, S.S., Youden, K.E., Harris, J.S. Jr and Hesselink, L., Appl. Phys. Lett. 65, 2018 (1994).CrossRefGoogle Scholar
8.Yang, Y.S., Ryu, M.K., Joo, H.J., Lee, S.H., Lee, S.J., Kang, K.Y., and Jang, M.S., Appl. Phys. Lett. 76, 3472 (2000).Google Scholar
9.Neurgaonkar, R.R. and Wu, E.T., Mater. Res. Bull. 22, 1095 (1987).CrossRefGoogle Scholar
10.Sakamoto, W., Yogo, T., Kawase, A., and Hirano, S.I., J. Am. Ceram. Soc. 81, 2692 (1998).CrossRefGoogle Scholar
11.Mak, C.L., Luk, C.H., and Wong, K.H., Thin Solid Films 325, 79 (1998).Google Scholar
12.Nystrom, M.J., Wessels, B.W., Lin, W.P., Wong, G.K., Neumayer, D.A., and Marker, T.J., Appl. Phys. Lett. 66, 1726 (1995).Google Scholar
13.Ulrich, D.R., J. Non-Cryst. Solid 121, 465 (1990).CrossRefGoogle Scholar
14.Ishikawa, K., Sakura, K., Fu, D.S., Yamada, S., Suzuki, H., and Hayashi, T., Jpn. J. Appl. Phys. 39, 5476 (2000).Google Scholar
15.Osaka, T., Yoshie, T., Hoshika, T., Koiwa, I., Sawada, Y., and Hashimoto, A., Jpn. J. Appl. Phys. 37, 5128 (1998).Google Scholar
16.Kim, S.H., Choi, Y.S., Kim, C.E., and Yang, D.Y., Thin Solid Films 325, 72 (1998).CrossRefGoogle Scholar
17.Hubler, G.K., Mater. Res. Soc. Bull. 17, 26 (1992).CrossRefGoogle Scholar
18.Ho, M.M.T., Mak, C.L., and Wong, K.H., J. Eur. Ceram. Soc. 19, 1115 (1999).Google Scholar