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Indentation load relaxation experiments with indentation depth in the submicron range

Published online by Cambridge University Press:  31 January 2011

W. R. LaFontaine ,
B. Yost ,
R. D. Black  and
C-Y. Li
W. R. LaFontaine
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853
B. Yost
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853
R. D. Black
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853
C-Y. Li
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853
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Abstract

Indentation load relaxation (ILR) experiments with indentation depths in the submicron range are described. Under appropriate conditions, the ILR data are found to yield flow curves of the same shape as those based on conventional load relaxation data. Variations in flow properties as a function of depth in submicron metal films deposited on a hard substrate are detected by the experiments described.

Type
Articles
Information
Journal of Materials Research , Volume 5 , Issue 10 , October 1990 , pp. 2100 - 2106
Copyright
Copyright © Materials Research Society 1990

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References

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