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Enhanced Nucleation and Decreased Growth Rates of Cu2O in Cu0.5Au0.5 (001) Thin Films During in situ Oxidation

Published online by Cambridge University Press:  01 July 2005

Liang Wang  and
Judith C. Yang
Liang Wang*
Affiliation:
Department of Materials Science and Engineering, University of Pittsburgh, Pittsburgh, Pennsylvania 15261
Judith C. Yang
Affiliation:
Department of Materials Science and Engineering, University of Pittsburgh, Pittsburgh, Pennsylvania 15261
*
a) Address all correspondence to this author.e-mail: liw6@pitt.edu
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Abstract

The initial oxidation behaviors of Cu–50 at.% Au (001) single-crystal thin film were studied by in situ ultra-high-vacuum transmission electron microscopy to model nano-oxidation of alloys with one oxidizing component and one inert component. The oxidation behaviors such as incubation time, oxide nucleation rate, oxide growth kinetics as well as nucleation activation energy were greatly changed by the addition of nonoxidizing Au. The reasons for these changes, such as Au segregation to the top surface, a decrease in Cu activity, and reduced lattice mismatch due to the addition of Au, were discussed, and a qualitative analysis of nucleation energetics was given.

Keywords

Oxidation/annealingThin filmTransmission electron microscopy (TEM)
Type
Articles
Information
Journal of Materials Research , Volume 20 , Issue 7 , July 2005 , pp. 1902 - 1909
Copyright
Copyright © Materials Research Society 2005

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