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Diffusion of water in silica glass

Published online by Cambridge University Press:  03 March 2011

Robert H. Doremus
Robert H. Doremus
Affiliation:
Materials Engineering Department, Rensselaer Polytechnic Institute, Troy, New York 12180
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Abstract

The diffusion of water into silica glass is modeled to result from the diffusion of molecular water into the glass and its reaction with the silicon-oxygen network to form SiOH groups. Equations for this diffusion-reaction mechanism are presented and compared with experimental diffusion profiles. At temperatures above about 500 °C the reaction goes to equilibrium, but at lower temperatures it does not, leading to a time dependence of the concentration of surface-reacted OH groups and of their apparent diffusion coefficient. At higher temperatures, the OH groups are nearly immobile, but diffuse far enough to sample neighboring OH groups, leading to a bimolecular reverse reaction. At lower temperatures only OH pairs react, giving a first-order reaction. When water tagged with O18 diffuses into silica, the O18 exchanges with O16 in the silicon-oxygen network of the glass. This process is also controlled by the rate of diffusion of molecular water into the glass, and the rate of O18-O16 exchange. This diffusion-reaction mechanism gives a unified description of the diffusion of water in silica glass from 160 °C to 1200 °C at least.

Type
Articles
Information
Journal of Materials Research , Volume 10 , Issue 9 , September 1995 , pp. 2379 - 2389
Copyright
Copyright © Materials Research Society 1995

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References

REFERENCES

1Moulson, A.J. and Roberts, J. P., Trans Faraday Society 57, 1208 (1961).CrossRefGoogle Scholar
2Burn, I. and Roberts, J.P., Phys. Chem. Glasses 11, 106 (1970), and references therein.Google Scholar
3Doremus, R. H., in Reactivity of Solids, edited by Mitchell, J.N., Devris, R.C., Roberts, R.W., and Cannon, P. (John Wiley, New York, 1969), p. 66.Google Scholar
4Pfeffer, R. and Ohring, M., J. Appl. Phys. 52, 777 (1981).CrossRefGoogle Scholar
5Tomozawa, M., J. Am. Ceram. Soc. 68, C-251 (1985).CrossRefGoogle Scholar
6Helmich, M. and Rauch, F., Glastech. Ber. 66, 195 (1993).Google Scholar
7Zhang, Y., Stolper, E. M., and Wasserburg, G. J., Geochim et Cosm. Acta. 55, 441 (1991).CrossRefGoogle Scholar
8Wakabayashi, H. and Tomozawa, M., J. Am. Ceram. Soc. 12, 1850 (1989).CrossRefGoogle Scholar
9Lanford, W. A., Burman, C., and Doremus, R. H., in Materials Sci. Res., Vol. 19, edited by Snyder, R. L. and Condrate, R. W. (Plenum Press, London, 1985), p. 203.Google Scholar
10Davis, K. M. and Tomozawa, M., in Diffusion in Amorphous Materials, edited by Jain, H. and Gupta, D. (TMS, Warrendale, PA, 1994), p. 119.Google Scholar
11Rigo, S., Rochet, F., Agius, B., and Straboni, A., J. Electrochem. Soc. 129, 867 (1982).CrossRefGoogle Scholar
12Rochet, F. and Rigo, S., Philos. Mag. B 55, 155 (1987).Google Scholar
13Crank, J., Mathematics of Diffusion, 2nd ed. (Oxford Press, London, 1975).Google Scholar
14Breed, D.J. and Doremus, R.H., J. Phys. Chem. 80, 2471 (1976).CrossRefGoogle Scholar
15Roberts, G. J. and Roberts, J.P., Phys. Chem. Glasses 5, 26 (1964).Google Scholar
16Drury, J., Roberts, G.J., and Roberts, J., in Advances in Glass Technology (Plenum Press, New York, 1965), p. 249.Google Scholar
17Doremus, R.H., Glass Science, 2nd ed. (John Wiley, New York, 1994), p. 135.Google Scholar
18Roberts, G.J. and Roberts, J.P., Phys. Chem. S1. 7, 82 (1986).Google Scholar
19Carslaw, H. S. and Jaeger, J.C., Conduction of Heat in Solids, 2nd ed. (Oxford Press, London, 1959).Google Scholar