Hostname: page-component-848d4c4894-tn8tq Total loading time: 0 Render date: 2024-06-29T22:15:32.859Z Has data issue: false hasContentIssue false

Determination of the Trap State Density Differences in Hydrogenated Amorphous Silicon-Germanium Alloys

Published online by Cambridge University Press:  03 March 2011

M. Boshta
Affiliation:
IV Physics Institute, University of Göttingen, D 37077 Göttingen, Germany
K. Bärner
Affiliation:
IV Physics Institute, University of Göttingen, D 37077 Göttingen, Germany
R. Braunstein*
Affiliation:
Department of Physics and Astronomy, University of California at Los Angeles, Los Angeles, California 90095
B. Alavi
Affiliation:
Department of Physics and Astronomy, University of California at Los Angeles, Los Angeles, California 90095
B. Nelson
Affiliation:
National Renewable Energy Laboratory, Golden, Colorado 80401
*
a)Address all correspondence to this author. e-mail: braunstein@physics.ucla.edu
Get access

Abstract

Time-resolved photo- and thermoelectric effects (TTE) were used to determine simultaneously trap levels and trap state density differences in amorphous (a-SiGe:H) samples. In particular, the trap state density differences are obtained from the decay of the ambipolar charge distribution (i.e., stage II of the TTE transients). This type of spectroscopy has been applied for the first time to a-SiGe:H samples, and indeed trap states that seem to relate to concentration fluctuations, that is, Si(Ge) and Ge(Si) clusters, are observed.

Type
Articles
Copyright
Copyright © Materials Research Society 2004

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Sasaki, M., Negeshi, H. and Inoue, M.: Pulsed laser-induced transient thermoelectric effects in silicon crystals. J. Appl. Phys. 59, 796 (1986).CrossRefGoogle Scholar
2Sasaki, M., Koyano, M. and Inoue, M.: Transient thermoelectric effects in intercelation compounds MxTiS2 (M=3d transition metals. J. Appl. Phys. 61, 2267 (1987).CrossRefGoogle Scholar
3Sasaki, M., Tai, G.X., Tamura, S. and Inoue, M: Dynamic study of conduct carriers in YBa2Cu3O7-delta thin films using a pulsed-laser-induced transient-thermoelectric-effect method. Phys. Rev. B 46, 1138 (1992).CrossRefGoogle ScholarPubMed
4Dong, S., Tang, Y., Braunstein, R., Medveda, I.V., Liebe, J., Heinmann, K. and Barner, K.: Transient ambipolar charge distribution in amorphous and microcrystalline semiconductors. Mater. Sci. Eng. B 47, 244 (1997).Google Scholar
5Xu, Y., Nelson, B.P., Gedvilas, L.M. and Reedy, R.C.: Improving narrow band gap a-SiGe:H alloys grown by hot wire chemical vapor deposition. Thin Solid Films 430, 197 (2003).CrossRefGoogle Scholar
6Liebe, J., Kattwinkel, A., Barner, K., Sun, G., Dong, S. and Braunstein, R.: Determination of the gap state density differences in hydrogenated amorphous silicon and Si/Ge. Mater. Sci. Eng. A 282, 158 (2000).CrossRefGoogle Scholar
7Kraus, E.: Anisotropic heat conduction in Mn2−xCrxSb single crystals. (Diplomarbeit, Goettingen, 1995).Google Scholar
8Boshta, M.: Characterization of hydrogenated silicon thin films and its alloys by photoconductive frequency mixing and thermoelectrix effects methods. (Diplomarbeit, Goettingen, 1995).Google Scholar
9Melson, B.P., Xu, Y., Williamson, D.L., Han, Daxing, Braunstein, R., Boshta, M. and Alavi, B.: Narrow gap a-SiGe:H grown by hot-wire chemical vapor deposition. Thin Solid Films 430, 104 (2003).Google Scholar
10Jadkar, S.R., Sali, J.V., Kshirsagar, S.T. and Takwale, M.G.: The effect of substrate temperature on HW-CVD deposited a-SiGe:H films. J. Non-Cryst. Solids 299, 168 (2002).CrossRefGoogle Scholar
11Braunstein, R.: Lattice vibration spectra of germanium-silicon alloys. Phys. Rev. 130, 879 (1963).CrossRefGoogle Scholar