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Aerosol jet fog (ajFOG) deposition of aluminum oxide phosphate thin films from an aqueous fog

Published online by Cambridge University Press:  27 September 2016

Nishit M. Murari ,
Ryan H. Mansergh ,
Yu Huang ,
Matthew G. Kast ,
Douglas A. Keszler  and
John F. Conley Jr.
Nishit M. Murari
Affiliation:
School of Electrical Engineering and Computer Science, Oregon State University, Corvallis, Oregon 97331-5501, USA
Ryan H. Mansergh
Affiliation:
Department of Chemistry, Oregon State University, Corvallis, Oregon 97331-4003, USA
Yu Huang
Affiliation:
Department of Chemistry, Oregon State University, Corvallis, Oregon 97331-4003, USA
Matthew G. Kast
Affiliation:
Department of Chemistry and Biochemistry, University of Oregon, Eugene, Oregon 97403-1253, USA
Douglas A. Keszler
Affiliation:
Department of Chemistry, Oregon State University, Corvallis, Oregon 97331-4003, USA
John F. Conley Jr.*
Affiliation:
School of Electrical Engineering and Computer Science, Oregon State University, Corvallis, Oregon 97331-5501, USA
*
a) Address all correspondence to this author. e-mail: jconley@eecs.oregonstate.edu
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Abstract

A new lab-based aerosol jet fog (ajFOG) deposition system with an atomizer consisting of two opposing jets located within the deposition chamber is introduced and its capabilities are examined. The unique opposing configuration of the atomizer enables the formation of a highly uniform fog even from low volatility precursors. Aluminum oxide phosphate (AlPO) thin films were deposited onto Si wafers at room temperature and sub-atmospheric pressure by using an aqueous precursor. Films were characterized by spectroscopic ellipsometry, x-ray diffraction and reflectivity, scanning electron microscopy, and metal/oxide/semiconductor (MOS) capacitor electrical measurements. Film thickness uniformity, density, surface roughness, and charge transport mechanisms were found to be comparable to spin-coated thin films deposited using the same precursor, demonstrating the effectiveness of this aerosol technique. A process model was developed to predict film thickness as a function of precursor concentration, exposure time, fog settling time, and number of exposures.

Keywords

thin filmspray depositionenvironmentally benign
Type
Articles
Information
Journal of Materials Research , Volume 31 , Issue 21 , 14 November 2016 , pp. 3303 - 3312
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Copyright
Copyright © Materials Research Society 2016 

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Footnotes

Contributing Editor: Gary L. Messing

References

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