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Comments on “Ion beam sputter deposition of YBa2Cu3O7−δ thin films” [J. Mater. Res. 8, 3032 (1993)]

Published online by Cambridge University Press:  03 March 2011

Andrea Gauzzi  and
Davor Pavuna
Andrea Gauzzi
Affiliation:
Department of Physics-IMO, Swiss Federal Institute of Technology at Lausanne (EPFL), CH-1015 Lausanne, Switzerland
Davor Pavuna
Affiliation:
Department of Physics-IMO, Swiss Federal Institute of Technology at Lausanne (EPFL), CH-1015 Lausanne, Switzerland
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Abstract

In this brief letter we want to comment on several statements published recently in the Journal of Materials Research by our former co-workers Kellett and James (KJ) in the paper entitled “Ion beam sputter deposition of YBa2Cu3O7−δ thin films”.

Type
Reply
Information
Journal of Materials Research , Volume 10 , Issue 10 , October 1995 , pp. 2676
Copyright
Copyright © Materials Research Society 1995

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References

REFERENCES

1Kellett, B. J. and James, J. H., J. Mater. Res. 8, 3032 (1993).Google Scholar
2Gauzzi, A., Lucia, M. L., Kellett, B. J., James, J. H., and Pavuna, D., Physica 182C(3), 57 (1991).Google Scholar
3Gauzzi, A., Lucia, M. L., Affronte, M., and Pavuna, D., Physica 185–189, 2563 (1991).CrossRefGoogle Scholar
4James, J. H., Kellett, B. J., Gauzzi, A., Dwir, B., and Pavuna, D., Appl. Surf. Sci. 43, 393 (1989).CrossRefGoogle Scholar
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7Gauzzi, A. and Pavuna, D., Appl. Phys. Lett. 66(14), 1836 (1995).CrossRefGoogle Scholar