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High damage threshold liquid crystal binary mask for laser beam shaping

  • Gang Xia (a1) (a2) (a3), Wei Fan (a1) (a2), Dajie Huang (a1) (a2), He Cheng (a1) (a2), Jiangtao Guo (a1) (a2) (a3) and Xiaoqin Wang (a1) (a2) (a3)...

Abstract

In order to improve the damage threshold and enlarge the aperture of a laser beam shaper, photolithographic patterning technology is adopted to design a new type of liquid crystal binary mask. The inherent conductive metal layer of commercial liquid crystal electro-optical spatial light modulators is replaced by azobenzene-based photoalignment layers patterned by noncontact photolithography. Using the azobenzene-based photoalignment layer, a liquid crystal binary mask for beam shaping is fabricated. In addition, the shaping ability, damage threshold, write/erase flexibility and stability of the liquid crystal binary mask are tested. Using a 1 Hz near-IR (1064 nm) laser, the multiple-shot nanosecond damage threshold of the liquid crystal mask is measured to be higher than $15~\text{J}/\text{cm}^{2}$ . The damage threshold of the azobenzene-based photoalignment layer is higher than $50~\text{J}/\text{cm}^{2}$ under the same testing conditions.

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Copyright

This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution, and reproduction in any medium, provided the original work is properly cited.

Corresponding author

Correspondence to: W. Fan and D. Huang, No. 390 Qinghe Road, Jiading, Shanghai 201800, China. Email: fanweil@siom.ac.cn (W. Fan); hdajie@siom.ac.cn (D. Huang)

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