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INFLUENCE OF ALUMINIUM ON GROWTH, MINERAL NUTRITION AND ORGANIC ACID EXUDATION OF RAMBUTAN (Nephelium lappaceum)

Published online by Cambridge University Press:  13 February 2015

DELVIS PÉREZ-ALMODÓVAR  and
RICARDO GOENAGA
DELVIS PÉREZ-ALMODÓVAR
Affiliation:
USDA-ARS, Tropical Agriculture Research Station, 2200 P.A. Campos Ave., Ste. 201 Mayaguez, Puerto Rico
RICARDO GOENAGA*
Affiliation:
USDA-ARS, Tropical Agriculture Research Station, 2200 P.A. Campos Ave., Ste. 201 Mayaguez, Puerto Rico
*
†Corresponding author. Email: ricardo.goenaga@ars.usda.gov
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Summary

A randomized complete block design experiment with six aluminium (Al) concentrations was carried out to evaluate the effect of Al on nutrient content, plant growth, dry matter production and Al-induced organic acid exudation in rambutan (Nephelium lappaceum). One rambutan cultivar was grown in nutrient solution at pH 4.0 with (1.0, 2.3, 4.1, 6.7 and 10.2 mM Al) and without Al. The results of this study confirms that this crop is highly tolerant to Al in the rhizosphere as evidenced by: (1) a root tolerance index (RTI) of 0.85 when plant roots are exposed to Al concentrations as high as 3.5 mM; (2) root tissue Al concentrations as high as 6800 mg g−1 and the plants survived; (3) number of leaves, plant height and stem diameter being little affected when plants were grown at an Al concentration in the soil solution as high as 3.5 mM; (4) although plants exhibited leaf abscission, they were able to tolerate Al concentrations in the nutrient solution as high as 10.2 mM during the experimental period. No evidence of organic acid exudation was found in this study. Accumulation of Al in leaves, stems and roots suggests the existence of an Al-sequestration mechanism in rambutan which may involve an Al-ligand complex which translocates from roots to shoots, where it may accumulate in leaf vacuoles.

Type
Research Article
Information
Experimental Agriculture , Volume 51 , Issue 4 , October 2015 , pp. 582 - 593
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This is a work of the U.S. Government and is not subject to copyright protection in the United States.
Copyright
Copyright © Cambridge University Press 2015

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